Quantum electronic stability of atomically uniform films

T. Miller, T. C. Chiang

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

Abstract

The valence electronic states in thin films are quantized by the films' boundaries. This represents a substantial modification of the band structure of the system which influences all physical properties. Dramatic variations in thermal stability are observed in thin metallic films on an atomic layer-by-layer basis. This chapter describes measurements of morphology, stability, and electronic structure of thin metallic films using angle-resolved photoemission spectroscopy, and discusses theoretical models that can predict stability based on the quantization of states. Further measurements using x-ray diffraction extend these results to structures more complex than uniform films.

Original languageEnglish
Title of host publicationThin Film Growth
Subtitle of host publicationPhysics, Materials Science and Applications
PublisherElsevier Ltd
Pages22-51
Number of pages30
ISBN (Print)9781845697365
DOIs
StatePublished - Jul 2011
Externally publishedYes

Keywords

  • Angle-resolved photoemission
  • Atomically uniform films
  • Metallic quantum wells
  • Quantum electronic stability
  • Thermal stability

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