Pushing the limits: An instrument for hard X-ray imaging below 20nm

E. Nazaretski; K. Lauer; H. Yan; N. Bouet; J. Zhou; R. Conley; X. Huang; W. Xu; M. Lu; K. Gofron; S. Kalbfleisch; U. Wagner; C. Rau; Y. S. Chu

doi:10.1107/S1600577514025715

Pushing the limits: An instrument for hard X-ray imaging below 20nm

E. Nazaretski, K. Lauer, H. Yan, N. Bouet, J. Zhou, R. Conley, X. Huang, W. Xu, M. Lu, K. Gofron, S. Kalbfleisch, U. Wagner, C. Rau, Y. S. Chu

Research output: Contribution to journal › Conference article › peer-review

69 Scopus citations

Abstract

Hard X-ray microscopy is a prominent tool suitable for nanoscale-resolution non-destructive imaging of various materials used in different areas of science and technology. With an ongoing effort to push the 2D/3D imaging resolution down to 10nm in the hard X-ray regime, both the fabrication of nano-focusing optics and the stability of the microscope using those optics become extremely challenging. In this work a microscopy system designed and constructed to accommodate multilayer Laue lenses as nanofocusing optics is presented. The developed apparatus has been thoroughly characterized in terms of resolution and stability followed by imaging experiments at a synchrotron facility. Drift rates of ∼2nmh^-1 accompanied by 13nm × 33nm imaging resolution at 11.8keV are reported.

Original language	English
Pages (from-to)	336-341
Number of pages	6
Journal	Journal of Synchrotron Radiation
Volume	22
Issue number	2
DOIs	https://doi.org/10.1107/S1600577514025715
State	Published - Mar 1 2015
Externally published	Yes
Event	8th International Workshop on X-ray Radiation Damage to Biological Crystalline Samples - Hamburg, Germany Duration: Apr 10 2014 → Apr 12 2014

Keywords

interferometry
multilayer Laue lenses
nanopositioning Includes papers presented at the 8th International Workshop on X-ray Radiation Damage to Biological Crystalline Samples
scanning X-ray microscopy

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title = "Pushing the limits: An instrument for hard X-ray imaging below 20nm",

abstract = "Hard X-ray microscopy is a prominent tool suitable for nanoscale-resolution non-destructive imaging of various materials used in different areas of science and technology. With an ongoing effort to push the 2D/3D imaging resolution down to 10nm in the hard X-ray regime, both the fabrication of nano-focusing optics and the stability of the microscope using those optics become extremely challenging. In this work a microscopy system designed and constructed to accommodate multilayer Laue lenses as nanofocusing optics is presented. The developed apparatus has been thoroughly characterized in terms of resolution and stability followed by imaging experiments at a synchrotron facility. Drift rates of ∼2nmh-1 accompanied by 13nm × 33nm imaging resolution at 11.8keV are reported.",

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author = "E. Nazaretski and K. Lauer and H. Yan and N. Bouet and J. Zhou and R. Conley and X. Huang and W. Xu and M. Lu and K. Gofron and S. Kalbfleisch and U. Wagner and C. Rau and Chu, {Y. S.}",

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AU - Nazaretski, E.

AU - Lauer, K.

AU - Yan, H.

AU - Bouet, N.

AU - Zhou, J.

AU - Conley, R.

AU - Huang, X.

AU - Xu, W.

AU - Lu, M.

AU - Gofron, K.

AU - Kalbfleisch, S.

AU - Wagner, U.

AU - Rau, C.

AU - Chu, Y. S.

PY - 2015/3/1

Y1 - 2015/3/1

N2 - Hard X-ray microscopy is a prominent tool suitable for nanoscale-resolution non-destructive imaging of various materials used in different areas of science and technology. With an ongoing effort to push the 2D/3D imaging resolution down to 10nm in the hard X-ray regime, both the fabrication of nano-focusing optics and the stability of the microscope using those optics become extremely challenging. In this work a microscopy system designed and constructed to accommodate multilayer Laue lenses as nanofocusing optics is presented. The developed apparatus has been thoroughly characterized in terms of resolution and stability followed by imaging experiments at a synchrotron facility. Drift rates of ∼2nmh-1 accompanied by 13nm × 33nm imaging resolution at 11.8keV are reported.

AB - Hard X-ray microscopy is a prominent tool suitable for nanoscale-resolution non-destructive imaging of various materials used in different areas of science and technology. With an ongoing effort to push the 2D/3D imaging resolution down to 10nm in the hard X-ray regime, both the fabrication of nano-focusing optics and the stability of the microscope using those optics become extremely challenging. In this work a microscopy system designed and constructed to accommodate multilayer Laue lenses as nanofocusing optics is presented. The developed apparatus has been thoroughly characterized in terms of resolution and stability followed by imaging experiments at a synchrotron facility. Drift rates of ∼2nmh-1 accompanied by 13nm × 33nm imaging resolution at 11.8keV are reported.

KW - interferometry

KW - multilayer Laue lenses

KW - nanopositioning Includes papers presented at the 8th International Workshop on X-ray Radiation Damage to Biological Crystalline Samples

KW - scanning X-ray microscopy

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M3 - Conference article

AN - SCOPUS:84924229995

SN - 0909-0495

VL - 22

SP - 336

EP - 341

JO - Journal of Synchrotron Radiation

JF - Journal of Synchrotron Radiation

IS - 2

Y2 - 10 April 2014 through 12 April 2014

ER -

Pushing the limits: An instrument for hard X-ray imaging below 20nm

Abstract

Keywords

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