Abstract
Mesoporous films of the metal chalcogenide β-FeSe were grown on MgO substrates by KrF pulsed laser deposition (PLD) in an argon background. At 100 mTorr, gated intensified charge-coupled device imaging and ion probe measurements showed that the plasma plume responsible for crystal growth initially comprised three components, with distinct expansion velocities. Plume interactions with the substrate heater and ablation target gave rise to complex dynamics, including collisions between the charged leading edge—rebounding between the substrate and the target—and slower-moving species in the plume interior. Film growth was dominated by species with kinetic energies ≤0.5 eV/atom. X-ray reflectivity revealed that films grown in this environment—with a substrate temperature of 350 °C, a laser fluence of 1.0 J cm−2, and a 7.5 mm2 spot area—formed a porous framework with 15% porosity. Atomic force microscopy showed surface features that suggest pore sizes below 100 nm. X-ray diffraction indicated that the porous films were epitaxial with respect to the substrate and likely grew by oriented-attachment of gas-phase molecular clusters or very small nanoparticles, in contrast to the conventional epitaxy of vacuum films from atomic constituents. The in-plane orientation of the mesoporous films was β-FeSe [100]∥[110] MgO, attributed to the soft landing of pre-formed crystallites on the MgO substrates, where protruding Se rows of β-FeSe aligned with corrugations of the MgO surface. This work implies that growth of candidate electrocatalyst materials by PLD in inert gas background may allow mesoporous frameworks with a single crystallographic orientation that expose specific crystal facets for electrochemical reactions and active site engineering. Notice: This manuscript has been authored by UT-Battelle, LLC, under Contract No. DE-AC05-00OR22725 with the U.S. Department of Energy. The United States Government retains and the publisher, by accepting the article for publication, acknowledges that the United States Government retains a non-exclusive, paid-up, irrevocable, world-wide license to publish or reproduce the published form of this manuscript, or allow others to do so, for United States Government purposes. The Department of Energy will provide public access to these results of federally sponsored research in accordance with the DOE Public Access Plan (http://energy.gov/downloads/doe-public-access-plan).
| Original language | English |
|---|---|
| Article number | 165842 |
| Journal | Applied Surface Science |
| Volume | 726 |
| DOIs | |
| State | Published - Apr 30 2026 |
Funding
This work was supported in part by the National Science Foundation (NSF), United States EPSCoR RII-Track-1 Cooperative Agreement OIA-2148653 . Plasma measurements as well as thin film growth and characterization was supported by the Center for Nanophase Materials Sciences (CNMS), United States , which is a US Department of Energy, Office of Science User Facility at Oak Ridge National Laboratory.
Keywords
- Cluster epitaxy
- Electrocatalyst
- Laser-generated plasma
- Mesoporous
- Metal chalcogenide
- Oriented attachment
- Plume dynamics