Pulsed laser-assisted helium ion nanomachining of monolayer graphene—direct-write kirigami patterns

Cheng Zhang, Ondrej Dyck, David A. Garfinkel, Michael G. Stanford, Alex A. Belianinov, Jason D. Fowlkes, Stephen Jesse, Philip D. Rack

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He+ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He+ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns.

Original languageEnglish
Article number1394
JournalNanomaterials
Volume9
Issue number10
DOIs
StatePublished - Oct 2019

Funding

Funding: The authors (P.D.R., J.D.F., A.A.B., S.J, and O.D.) acknowledge support from the Center for Nanophase Funding: The authors (P.D.R., J.D.F., A.A.B., S.J, and O.D.) acknowledge support from the Center for Nanophase Maftreormialtsh SecUie.nS.cDese,pwarhtimche nist oafDEOneErgOyf(fDicOe Eo)f uthned eSrcigernacnet Unos.erD FEa-SciCli0ty00. 2C1.3Z6..aDn.dAM.G..Ga.cSk.n aocwknleodwgleesdtghee support by from the U.S. Department of Energy (DOE) under grant no. DE-SC0002136. D.A.G. acknowledges the support Acknowledgments: We acknowledge Walker L. Boldman for the help on graphic design for the schematic figure. The authors (P.D.R., J.D.F., A.A.B., S.J, and O.D.) acknowledge support from the Center for Nanophase Materials Sciences, which is a DOE Office of the Science User Facility. C.Z. and M.G.S. acknowledge support from the U.S. Department of Energy (DOE) under grant no. DE-SC0002136. D.A.G. acknowledges the support by NSFCBET-1603780.

FundersFunder number
Center for Nanophase Funding
Center for Nanophase Maftreormialtsh SecUie.nS.cDese
Center for Nanophase Materials Sciences
DOE Office of the Science User Facility
National Science Foundation1853201
U.S. Department of EnergyNSFCBET-1603780, DE-SC0002136

    Keywords

    • Direct-write kirigami
    • Graphene
    • Nanopatterning
    • Pulsed laser

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