Pulsed laser-assisted helium ion nanomachining of monolayer graphene—direct-write kirigami patterns

Cheng Zhang; Ondrej Dyck; David A. Garfinkel; Michael G. Stanford; Alex A. Belianinov; Jason D. Fowlkes; Stephen Jesse; Philip D. Rack

doi:10.3390/nano9101394

Pulsed laser-assisted helium ion nanomachining of monolayer graphene—direct-write kirigami patterns

Cheng Zhang, Ondrej Dyck, David A. Garfinkel, Michael G. Stanford, Alex A. Belianinov, Jason D. Fowlkes, Stephen Jesse, Philip D. Rack

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He⁺ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He⁺ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns.

Original language	English
Article number	1394
Journal	Nanomaterials
Volume	9
Issue number	10
DOIs	https://doi.org/10.3390/nano9101394
State	Published - Oct 2019

Funding

Funding: The authors (P.D.R., J.D.F., A.A.B., S.J, and O.D.) acknowledge support from the Center for Nanophase Funding: The authors (P.D.R., J.D.F., A.A.B., S.J, and O.D.) acknowledge support from the Center for Nanophase Maftreormialtsh SecUie.nS.cDese,pwarhtimche nist oafDEOneErgOyf(fDicOe Eo)f uthned eSrcigernacnet Unos.erD FEa-SciCli0ty00. 2C1.3Z6..aDn.dAM.G..Ga.cSk.n aocwknleodwgleesdtghee support by from the U.S. Department of Energy (DOE) under grant no. DE-SC0002136. D.A.G. acknowledges the support Acknowledgments: We acknowledge Walker L. Boldman for the help on graphic design for the schematic figure. The authors (P.D.R., J.D.F., A.A.B., S.J, and O.D.) acknowledge support from the Center for Nanophase Materials Sciences, which is a DOE Office of the Science User Facility. C.Z. and M.G.S. acknowledge support from the U.S. Department of Energy (DOE) under grant no. DE-SC0002136. D.A.G. acknowledges the support by NSFCBET-1603780.

Funders	Funder number
Center for Nanophase Funding
Center for Nanophase Maftreormialtsh SecUie.nS.cDese
Center for Nanophase Materials Sciences
DOE Office of the Science User Facility
National Science Foundation	1853201
U.S. Department of Energy	NSFCBET-1603780, DE-SC0002136

Keywords

Direct-write kirigami
Graphene
Nanopatterning
Pulsed laser

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.3390/nano9101394

Cite this

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title = "Pulsed laser-assisted helium ion nanomachining of monolayer graphene—direct-write kirigami patterns",

abstract = "A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He+ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He+ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns.",

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AU - Zhang, Cheng

AU - Dyck, Ondrej

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AU - Stanford, Michael G.

AU - Belianinov, Alex A.

AU - Fowlkes, Jason D.

AU - Jesse, Stephen

AU - Rack, Philip D.

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AB - A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He+ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He+ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns.

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KW - Pulsed laser

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Pulsed laser-assisted helium ion nanomachining of monolayer graphene—direct-write kirigami patterns

Abstract

Funding

Keywords

UN SDGs

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