Proactive control of the growth behavior of a thermally grown oxide by a chemically vapor deposited Al2O3 layer

Proactive control of the growth behavior of a thermally grown oxide by a chemically vapor deposited Al₂O₃ layer

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	678-679
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	9
Issue number	SUPPL. 2
DOIs	https://doi.org/10.1017/s1431927603443390
State	Published - 2003

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title = "Proactive control of the growth behavior of a thermally grown oxide by a chemically vapor deposited Al2O3 layer",

author = "Su, \{Y. F.\} and Allard, \{L. F.\} and Coffey, \{D. W.\} and Lee, \{W. Y.\}",

year = "2003",

doi = "10.1017/s1431927603443390",

language = "English",

volume = "9",

pages = "678--679",

journal = "Microscopy and Microanalysis",

issn = "1431-9276",

publisher = "Oxford University Press",

number = "SUPPL. 2",

}

TY - JOUR

T1 - Proactive control of the growth behavior of a thermally grown oxide by a chemically vapor deposited Al2O3 layer

AU - Su, Y. F.

AU - Allard, L. F.

AU - Coffey, D. W.

AU - Lee, W. Y.

PY - 2003

Y1 - 2003

UR - https://www.scopus.com/pages/publications/0042922947

U2 - 10.1017/s1431927603443390

DO - 10.1017/s1431927603443390

M3 - Article

AN - SCOPUS:0042922947

SN - 1431-9276

VL - 9

SP - 678

EP - 679

JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

IS - SUPPL. 2

ER -