TY - JOUR
T1 - Preferred orientation, phase formation and the electrical properties of pulsed laser deposited SrBi2Ta2O9 thin films
AU - Fujimura, Norifumi
AU - Thomas, Darin T.
AU - Streiffer, Stephen K.
AU - Kingon, Angus I.
PY - 1998/9
Y1 - 1998/9
N2 - Systematic studies on the preferred orientation, phase formation and the electrical properties of pulsed laser deposited SrBi2Ta2O9 (SBT) have been performed. At a substrate temperature of 600°C, the film on SiO2 was not crystallized. Above 650°C, very strong diffraction from a non-ferroelectric, (III)-oriented fluorite phase was obtained. Its crystallinity increased with increasing Bi content in the target. The fluorite phase was also observed in the film on Pt deposited below 600°C, which together with the pyrochlore phase resulted in the formation of an interfacial reaction product, Bi2Pt. Above 650°C, the films tend to grow as the perovskite SBT phase with a c-axis orientation which is not the polarization axis. In contrast, the formation of the fluorite and pyrochlore phases can be suppressed on Ir electrodes.
AB - Systematic studies on the preferred orientation, phase formation and the electrical properties of pulsed laser deposited SrBi2Ta2O9 (SBT) have been performed. At a substrate temperature of 600°C, the film on SiO2 was not crystallized. Above 650°C, very strong diffraction from a non-ferroelectric, (III)-oriented fluorite phase was obtained. Its crystallinity increased with increasing Bi content in the target. The fluorite phase was also observed in the film on Pt deposited below 600°C, which together with the pyrochlore phase resulted in the formation of an interfacial reaction product, Bi2Pt. Above 650°C, the films tend to grow as the perovskite SBT phase with a c-axis orientation which is not the polarization axis. In contrast, the formation of the fluorite and pyrochlore phases can be suppressed on Ir electrodes.
KW - Ferroelectric properties
KW - Fluorite phase
KW - Preferred orientation
KW - Pyrochlore phase
KW - SrBiTaO
UR - http://www.scopus.com/inward/record.url?scp=0032154807&partnerID=8YFLogxK
U2 - 10.1143/jjap.37.5185
DO - 10.1143/jjap.37.5185
M3 - Article
AN - SCOPUS:0032154807
SN - 0021-4922
VL - 37
SP - 5185
EP - 5188
JO - Japanese Journal of Applied Physics, Part 2: Letters
JF - Japanese Journal of Applied Physics, Part 2: Letters
IS - 9 PART B
ER -