Positive and negative contrast lithography on silver quantum dot monolayers

Sven E. Henrichs, Jennifer L. Sample, Joe J. Shiang, James R. Heath, Charles P. Collier, Richard J. Saykally

Research output: Contribution to journalReview articlepeer-review

13 Scopus citations

Abstract

Scanning nonlinear optical microscopy, at a resolution of ̃2 μm, was utilized to examine monolayers of alkylthiol-passivated silver nanocrystals. Selected regions of the monolayers were irradiated with a pulse train of picosecond 1064 nm laser pulses, and then the second harmonic generation (SHG) response of those monolayers was recorded in a second scan. Two lithographic processes - one leading to a negative contrast SHG image (observed for particles <4 nm diameter) and a second leading to a positive contrast SHG image (observed for larger particles)-were found. These processes are explained within the context of literature models that account for particle size dependent energy partitioning.

Original languageEnglish
Pages (from-to)3524-3528
Number of pages5
JournalJournal of Physical Chemistry B
Volume103
Issue number18
DOIs
StatePublished - May 6 1999
Externally publishedYes

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