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Plasma generation by household microwave oven for surface modification and other emerging applications

  • Benjamin K. Barnes
  • , Habilou Ouro-Koura
  • , Justin Derickson
  • , Samuel Lebarty
  • , Jesudara Omidokun
  • , Nathan Bane
  • , Othman Suleiman
  • , Eguono Omagamre
  • , Mahdi J. Fotouhi
  • , Ayobami Ogunmolasuyi
  • , Arturo Dominguez
  • , Larry Gonick
  • , Kausik S. Das

Research output: Contribution to journal › Article › peer-review

23 Scopus citations

Abstract

A simple and inexpensive method to generate plasma using a kitchen microwave oven is described in this paper. The microwave-generated plasma is characterized by spectroscopic analysis and compared with the absorption spectra of a gas discharge tube. A Paschen-like curve is observed as the microwave plasma initiation time is plotted as a function of the pressure of the plasma chamber. We have also demonstrated that this microwave-generated air plasma can be used in a multitude of applications such as: (a) surface modification of a substrate to change its wettability; (b) surface modification to change electrical/optical properties of a substrate; and (c) enhancement of adhesive forces for improved bonding of polymeric microfluidic molds, such as bonding polydimethylsiloxane (PDMS) chips to glass covers. These simple techniques of plasma generation and subsequent surface treatment and modification applications may bring new opportunities leading to new innovations not only in advanced labs, but also in undergraduate and even high school research labs.

Original languageEnglish
Pages (from-to)372-382
Number of pages11
JournalAmerican Journal of Physics
Volume89
Issue number4
DOIs
StatePublished - Apr 1 2021
Externally publishedYes

Funding

This work was partially supported by the National Science Foundation (HBCU-UP Award # 1719425), the Department of Education (MSEIP Award # P120A70068) with MSEIP CCEM Supplemental award, and Maryland Technology Enterprise Institute through MIPS grant. K.D. would like to thank Dr. Jim Marty of Minnesota Nano-Science Center and NanoLink for providing support and materials for the photolithography process in microchannel fabrication and Dr. Aaron Persad of MIT for many helpful discussions and suggestions. The authors also thank MIT Technology Review for featuring this work.45

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