Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure

Engineering

• Nitride 100%
• High Ion Energy 100%
• Atomic Layer Deposition 100%
• Ray Diffraction 50%
• Substrate Temperature 50%
• Bias Voltage 50%
• Deposited Film 50%
• Porous Film 50%
• Low Growth Rate 50%
• Substrate Bias 50%
• Bombardment 50%
• Probe Point 50%
• Nanocrystalline 50%
• Thin Films 50%
• Crystal Structure 50%
• Epitaxial Film 50%
• Coefficient of Friction 50%

Material Science

• Density 100%
• Molybdenum 100%
• Titanium 100%
• Film 100%
• Nitride Compound 100%
• Nanocrystalline 33%
• Electrical Resistivity 33%
• Sapphire 33%
• Grain Size 33%
• Oxide Compound 33%
• Coefficient of Friction 33%
• Thin Films 33%
• Crystal Structure 33%
• Single Crystal 33%
• Epitaxial Film 33%

Earth and Planetary Sciences

• Nitride 100%
• Atomic Layer Epitaxy 100%
• Grain Size 50%
• Single Crystal 50%
• Thin Films 50%
• Coefficient of Friction 50%
• Halite 50%
• Crystal Structure 50%
• Porosity 50%