Photo-switching Behavior of Microphase Separated Structure in Liquid Crystalline Azobenzene Block Copolymers Possessing Different Poly(alkyl methacrylate) Blocks

Masami Sano; Tomoya Murase; Mitsuo Hara; Shusaku Nagano; Yuya Shinohara; Yoshiyuki Amemiya; Takahiro Seki

doi:10.1080/15421406.2015.1075356

Photo-switching Behavior of Microphase Separated Structure in Liquid Crystalline Azobenzene Block Copolymers Possessing Different Poly(alkyl methacrylate) Blocks

Masami Sano, Tomoya Murase, Mitsuo Hara, Shusaku Nagano, Yuya Shinohara, Yoshiyuki Amemiya, Takahiro Seki

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

We have recently reported the photo-switching process of hierarchical structures of microphase separated (MPS) cylindrical structures embedded in a liquid crystalline (LC) phase in a film of a diblock copolymer composed of amorphous poly(butyl methacrylate) (PBMA) and a light responsive LC azobenzene (Az) blocks. In the present work, homologous poly(alkyl methacrylate) of poly(hexyl methacrylate) (PHMA) and poly(octadecyl methacrylate) (PODMA) are introduced as the cylinder forming polymer block. The Az mesogens and MPS cylinders in these polymers were aligned in the in-plane direction, and the alignments were photo-switched by changing LPL irradiation direction. The PODMA containing block copolymer exhibited a different reorientation behavior from PHMA or PBMA contained block copolymer. It was suggested that the viscosity or fluidity of cylindrical polymer affect the photoswitching alignment behavior.

Original language	English
Pages (from-to)	5-13
Number of pages	9
Journal	Molecular Crystals and Liquid Crystals
Volume	617
Issue number	1
DOIs	https://doi.org/10.1080/15421406.2015.1075356
State	Published - Aug 13 2015
Externally published	Yes

Funding

This work was supported by a Grant-in-Aid for Scientific Research (S23225003 to TS and B25286025 to SN) and for Young Scientists (B25810117 to MH) from The Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan, and the PRESTO program of Japan Science and Technology Agency to SN. The synchrotron X-ray scattering experiments were performed at BL-6A of the KEK-Photon Factory, Tsukuba (proposal No. 2012G629).

Keywords

azobenezene
liquid crystalline diblock copolymer
microphase separation structure
photoalignment
photoswitching
real-time GI-SAXS measurement

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title = "Photo-switching Behavior of Microphase Separated Structure in Liquid Crystalline Azobenzene Block Copolymers Possessing Different Poly(alkyl methacrylate) Blocks",

abstract = "We have recently reported the photo-switching process of hierarchical structures of microphase separated (MPS) cylindrical structures embedded in a liquid crystalline (LC) phase in a film of a diblock copolymer composed of amorphous poly(butyl methacrylate) (PBMA) and a light responsive LC azobenzene (Az) blocks. In the present work, homologous poly(alkyl methacrylate) of poly(hexyl methacrylate) (PHMA) and poly(octadecyl methacrylate) (PODMA) are introduced as the cylinder forming polymer block. The Az mesogens and MPS cylinders in these polymers were aligned in the in-plane direction, and the alignments were photo-switched by changing LPL irradiation direction. The PODMA containing block copolymer exhibited a different reorientation behavior from PHMA or PBMA contained block copolymer. It was suggested that the viscosity or fluidity of cylindrical polymer affect the photoswitching alignment behavior.",

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author = "Masami Sano and Tomoya Murase and Mitsuo Hara and Shusaku Nagano and Yuya Shinohara and Yoshiyuki Amemiya and Takahiro Seki",

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AU - Sano, Masami

AU - Murase, Tomoya

AU - Hara, Mitsuo

AU - Nagano, Shusaku

AU - Shinohara, Yuya

AU - Amemiya, Yoshiyuki

AU - Seki, Takahiro

PY - 2015/8/13

Y1 - 2015/8/13

N2 - We have recently reported the photo-switching process of hierarchical structures of microphase separated (MPS) cylindrical structures embedded in a liquid crystalline (LC) phase in a film of a diblock copolymer composed of amorphous poly(butyl methacrylate) (PBMA) and a light responsive LC azobenzene (Az) blocks. In the present work, homologous poly(alkyl methacrylate) of poly(hexyl methacrylate) (PHMA) and poly(octadecyl methacrylate) (PODMA) are introduced as the cylinder forming polymer block. The Az mesogens and MPS cylinders in these polymers were aligned in the in-plane direction, and the alignments were photo-switched by changing LPL irradiation direction. The PODMA containing block copolymer exhibited a different reorientation behavior from PHMA or PBMA contained block copolymer. It was suggested that the viscosity or fluidity of cylindrical polymer affect the photoswitching alignment behavior.

AB - We have recently reported the photo-switching process of hierarchical structures of microphase separated (MPS) cylindrical structures embedded in a liquid crystalline (LC) phase in a film of a diblock copolymer composed of amorphous poly(butyl methacrylate) (PBMA) and a light responsive LC azobenzene (Az) blocks. In the present work, homologous poly(alkyl methacrylate) of poly(hexyl methacrylate) (PHMA) and poly(octadecyl methacrylate) (PODMA) are introduced as the cylinder forming polymer block. The Az mesogens and MPS cylinders in these polymers were aligned in the in-plane direction, and the alignments were photo-switched by changing LPL irradiation direction. The PODMA containing block copolymer exhibited a different reorientation behavior from PHMA or PBMA contained block copolymer. It was suggested that the viscosity or fluidity of cylindrical polymer affect the photoswitching alignment behavior.

KW - azobenezene

KW - liquid crystalline diblock copolymer

KW - microphase separation structure

KW - photoalignment

KW - photoswitching

KW - real-time GI-SAXS measurement

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Photo-switching Behavior of Microphase Separated Structure in Liquid Crystalline Azobenzene Block Copolymers Possessing Different Poly(alkyl methacrylate) Blocks

Abstract

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Keywords

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