Abstract
Biaxial stress is identified to play an important role in the polar orthorhombic phase stability in hafnium oxide-based ferroelectric thin films. However, the stress state during various stages of wake-up has not yet been quantified. In this work, the stress evolution with field cycling in hafnium zirconium oxide capacitors is evaluated. The remanent polarization of a 20 nm thick hafnium zirconium oxide thin film increases from 9.80 to 15.0 µC cm−2 following 106 field cycles. This increase in remanent polarization is accompanied by a decrease in relative permittivity that indicates that a phase transformation has occurred. The presence of a phase transformation is supported by nano-Fourier transform infrared spectroscopy measurements and scanning transmission electron microscopy that show an increase in ferroelectric phase content following wake-up. The stress of individual devices field cycled between pristine and 106 cycles is quantified using the sin2(ψ) technique, and the biaxial stress is observed to decrease from 4.3 ± 0.2 to 3.2 ± 0.3 GPa. The decrease in stress is attributed, in part, to a phase transformation from the antipolar Pbca phase to the ferroelectric Pca21 phase. This work provides new insight into the mechanisms controlling and/or accompanying polarization wake-up in hafnium oxide-based ferroelectrics.
Original language | English |
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Article number | 2400151 |
Journal | Advanced Electronic Materials |
Volume | 10 |
Issue number | 11 |
DOIs | |
State | Published - Nov 2024 |
Funding
Thin film synthesis, electrical characterization, X\u2010ray diffraction, electron microscopy, and nano\u2010FTIR were supported by the Center for 3D Ferroelectric Microelectronics (3DFeM), an Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Basic Energy Sciences under Award No. DE\u2010SC0021118. S.T.J. acknowledges support from the U.S. National Science Foundation's Graduate Research Fellowship Program under grant DGE\u20101842490. This research used resources of the Advanced Light Source, which is a DOE Office of Science User Facility under contract no. DE\u2010AC02\u201005CH11231. The authors acknowledge beamline scientists Hans Bechtel and Stephanie Gilbert Corder for their technical assistance in nano\u2010FTIR measurements. This work utilized a Bruker D8 Venture instrument, which was acquired under Award CHE\u20102018870 from the U.S. National Science Foundation's Major Research Instrumentation program. S.T.J. acknowledges support by the Laboratory Directed Research and Development program at Sandia National Laboratories, a multimission laboratory managed and operated by National Technology and Engineering Solutions of Sandia LLC, a wholly\u2010owned subsidiary of Honeywell International Inc. for the U.S. Department of Energy's National Nuclear Security Administration under contract DE\u2010NA0003525.
Keywords
- X-ray diffraction
- ferroelectric hafnium oxide
- stress
- thin film