Phase stability for the in situ growth of Nd1+xBa2-xCu3Oy films using pulsed-laser deposition

C. Cantoni; D. P. Norton; D. M. Kroeger; M. Paranthaman; D. K. Christen; D. Verebelyi; R. Feenstra; D. F. Lee; E. D. Specht; V. Boffa; S. Pace

doi:10.1063/1.123162

Phase stability for the in situ growth of Nd_1+xBa_2-xCu₃O_y films using pulsed-laser deposition

C. Cantoni
, D. P. Norton
, D. M. Kroeger
, M. Paranthaman
, D. K. Christen
, D. Verebelyi
, R. Feenstra
, D. F. Lee
, E. D. Specht
, V. Boffa
, S. Pace

Nanomaterials Chemistry Group

Research output: Contribution to journal › Article › peer-review

36 Scopus citations

Abstract

We have determined the stability line in the 1/T-log[P(O₂)] phase space for the synthesis of Nd_1+xBa_2-xCu₃O_y (NdBCO) films. A systematic study of T_c, J_c, and ρ(T) dependence on oxygen partial pressure and temperature for the deposition of thin NdBCO films grown by pulsed-laser deposition was performed. The conditions for optimal NdBCO film growth were determined by varying oxygen partial pressure from 0.02 to 400 mTorr, and substrate temperature between 730 and 800 °C. The results show that the best NdBCO films are obtained at oxygen pressures in the range of 0.2-1.2 mTorr, depending on the substrate temperature. This is more than two orders-of-magnitude lower than the correspondent oxygen pressure appropriate for YBa₂Cu₃O_7-δ film growth.

Original language	English
Pages (from-to)	96-98
Number of pages	3
Journal	Applied Physics Letters
Volume	74
Issue number	1
DOIs	https://doi.org/10.1063/1.123162
State	Published - 1999

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@article{7d1af92ab1e5446aa4f9a91cc963ba52,

title = "Phase stability for the in situ growth of Nd1+xBa2-xCu3Oy films using pulsed-laser deposition",

abstract = "We have determined the stability line in the 1/T-log[P(O2)] phase space for the synthesis of Nd1+xBa2-xCu3Oy (NdBCO) films. A systematic study of Tc, Jc, and ρ(T) dependence on oxygen partial pressure and temperature for the deposition of thin NdBCO films grown by pulsed-laser deposition was performed. The conditions for optimal NdBCO film growth were determined by varying oxygen partial pressure from 0.02 to 400 mTorr, and substrate temperature between 730 and 800 °C. The results show that the best NdBCO films are obtained at oxygen pressures in the range of 0.2-1.2 mTorr, depending on the substrate temperature. This is more than two orders-of-magnitude lower than the correspondent oxygen pressure appropriate for YBa2Cu3O7-δ film growth.",

author = "C. Cantoni and Norton, \{D. P.\} and Kroeger, \{D. M.\} and M. Paranthaman and Christen, \{D. K.\} and D. Verebelyi and R. Feenstra and Lee, \{D. F.\} and Specht, \{E. D.\} and V. Boffa and S. Pace",

year = "1999",

doi = "10.1063/1.123162",

language = "English",

volume = "74",

pages = "96--98",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "1",

}

TY - JOUR

T1 - Phase stability for the in situ growth of Nd1+xBa2-xCu3Oy films using pulsed-laser deposition

AU - Cantoni, C.

AU - Norton, D. P.

AU - Kroeger, D. M.

AU - Paranthaman, M.

AU - Christen, D. K.

AU - Verebelyi, D.

AU - Feenstra, R.

AU - Lee, D. F.

AU - Specht, E. D.

AU - Boffa, V.

AU - Pace, S.

PY - 1999

Y1 - 1999

N2 - We have determined the stability line in the 1/T-log[P(O2)] phase space for the synthesis of Nd1+xBa2-xCu3Oy (NdBCO) films. A systematic study of Tc, Jc, and ρ(T) dependence on oxygen partial pressure and temperature for the deposition of thin NdBCO films grown by pulsed-laser deposition was performed. The conditions for optimal NdBCO film growth were determined by varying oxygen partial pressure from 0.02 to 400 mTorr, and substrate temperature between 730 and 800 °C. The results show that the best NdBCO films are obtained at oxygen pressures in the range of 0.2-1.2 mTorr, depending on the substrate temperature. This is more than two orders-of-magnitude lower than the correspondent oxygen pressure appropriate for YBa2Cu3O7-δ film growth.

AB - We have determined the stability line in the 1/T-log[P(O2)] phase space for the synthesis of Nd1+xBa2-xCu3Oy (NdBCO) films. A systematic study of Tc, Jc, and ρ(T) dependence on oxygen partial pressure and temperature for the deposition of thin NdBCO films grown by pulsed-laser deposition was performed. The conditions for optimal NdBCO film growth were determined by varying oxygen partial pressure from 0.02 to 400 mTorr, and substrate temperature between 730 and 800 °C. The results show that the best NdBCO films are obtained at oxygen pressures in the range of 0.2-1.2 mTorr, depending on the substrate temperature. This is more than two orders-of-magnitude lower than the correspondent oxygen pressure appropriate for YBa2Cu3O7-δ film growth.

UR - https://www.scopus.com/pages/publications/0033521314

U2 - 10.1063/1.123162

DO - 10.1063/1.123162

M3 - Article

AN - SCOPUS:0033521314

SN - 0003-6951

VL - 74

SP - 96

EP - 98

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 1

ER -

Phase stability for the in situ growth of Nd_1+xBa_2-xCu₃O_y films using pulsed-laser deposition

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