Phase stability for the in situ growth of Nd1+xBa2-xCu3Oy films using pulsed-laser deposition

C. Cantoni; D. P. Norton; D. M. Kroeger; M. Paranthaman; D. K. Christen; D. Verebelyi; R. Feenstra; D. F. Lee; E. D. Specht; V. Boffa; S. Pace

doi:10.1063/1.123162

Phase stability for the in situ growth of Nd_1+xBa_2-xCu₃O_y films using pulsed-laser deposition

C. Cantoni, D. P. Norton, D. M. Kroeger, M. Paranthaman, D. K. Christen, D. Verebelyi, R. Feenstra, D. F. Lee, E. D. Specht, V. Boffa, S. Pace

Nanomaterials Chemistry Group

Research output: Contribution to journal › Article › peer-review

36 Scopus citations

Abstract

We have determined the stability line in the 1/T-log[P(O₂)] phase space for the synthesis of Nd_1+xBa_2-xCu₃O_y (NdBCO) films. A systematic study of T_c, J_c, and ρ(T) dependence on oxygen partial pressure and temperature for the deposition of thin NdBCO films grown by pulsed-laser deposition was performed. The conditions for optimal NdBCO film growth were determined by varying oxygen partial pressure from 0.02 to 400 mTorr, and substrate temperature between 730 and 800 °C. The results show that the best NdBCO films are obtained at oxygen pressures in the range of 0.2-1.2 mTorr, depending on the substrate temperature. This is more than two orders-of-magnitude lower than the correspondent oxygen pressure appropriate for YBa₂Cu₃O_7-δ film growth.

Original language	English
Pages (from-to)	96-98
Number of pages	3
Journal	Applied Physics Letters
Volume	74
Issue number	1
DOIs	https://doi.org/10.1063/1.123162
State	Published - 1999

Access to Document

10.1063/1.123162

Cite this

@article{7d1af92ab1e5446aa4f9a91cc963ba52,

title = "Phase stability for the in situ growth of Nd1+xBa2-xCu3Oy films using pulsed-laser deposition",

abstract = "We have determined the stability line in the 1/T-log[P(O2)] phase space for the synthesis of Nd1+xBa2-xCu3Oy (NdBCO) films. A systematic study of Tc, Jc, and ρ(T) dependence on oxygen partial pressure and temperature for the deposition of thin NdBCO films grown by pulsed-laser deposition was performed. The conditions for optimal NdBCO film growth were determined by varying oxygen partial pressure from 0.02 to 400 mTorr, and substrate temperature between 730 and 800 °C. The results show that the best NdBCO films are obtained at oxygen pressures in the range of 0.2-1.2 mTorr, depending on the substrate temperature. This is more than two orders-of-magnitude lower than the correspondent oxygen pressure appropriate for YBa2Cu3O7-δ film growth.",

author = "C. Cantoni and Norton, {D. P.} and Kroeger, {D. M.} and M. Paranthaman and Christen, {D. K.} and D. Verebelyi and R. Feenstra and Lee, {D. F.} and Specht, {E. D.} and V. Boffa and S. Pace",

year = "1999",

doi = "10.1063/1.123162",

language = "English",

volume = "74",

pages = "96--98",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "1",

}

TY - JOUR

T1 - Phase stability for the in situ growth of Nd1+xBa2-xCu3Oy films using pulsed-laser deposition

AU - Cantoni, C.

AU - Norton, D. P.

AU - Kroeger, D. M.

AU - Paranthaman, M.

AU - Christen, D. K.

AU - Verebelyi, D.

AU - Feenstra, R.

AU - Lee, D. F.

AU - Specht, E. D.

AU - Boffa, V.

AU - Pace, S.

PY - 1999

Y1 - 1999

N2 - We have determined the stability line in the 1/T-log[P(O2)] phase space for the synthesis of Nd1+xBa2-xCu3Oy (NdBCO) films. A systematic study of Tc, Jc, and ρ(T) dependence on oxygen partial pressure and temperature for the deposition of thin NdBCO films grown by pulsed-laser deposition was performed. The conditions for optimal NdBCO film growth were determined by varying oxygen partial pressure from 0.02 to 400 mTorr, and substrate temperature between 730 and 800 °C. The results show that the best NdBCO films are obtained at oxygen pressures in the range of 0.2-1.2 mTorr, depending on the substrate temperature. This is more than two orders-of-magnitude lower than the correspondent oxygen pressure appropriate for YBa2Cu3O7-δ film growth.

AB - We have determined the stability line in the 1/T-log[P(O2)] phase space for the synthesis of Nd1+xBa2-xCu3Oy (NdBCO) films. A systematic study of Tc, Jc, and ρ(T) dependence on oxygen partial pressure and temperature for the deposition of thin NdBCO films grown by pulsed-laser deposition was performed. The conditions for optimal NdBCO film growth were determined by varying oxygen partial pressure from 0.02 to 400 mTorr, and substrate temperature between 730 and 800 °C. The results show that the best NdBCO films are obtained at oxygen pressures in the range of 0.2-1.2 mTorr, depending on the substrate temperature. This is more than two orders-of-magnitude lower than the correspondent oxygen pressure appropriate for YBa2Cu3O7-δ film growth.

UR - http://www.scopus.com/inward/record.url?scp=0033521314&partnerID=8YFLogxK

U2 - 10.1063/1.123162

DO - 10.1063/1.123162

M3 - Article

AN - SCOPUS:0033521314

SN - 0003-6951

VL - 74

SP - 96

EP - 98

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 1

ER -

Phase stability for the in situ growth of Nd_1+xBa_2-xCu₃O_y films using pulsed-laser deposition

Abstract

Access to Document

Other files and links

Fingerprint

Cite this