Abstract
Transition metal dichalcogenide (TMD) alloys form a broad class of two-dimensional (2D) layered materials with tunable bandgaps leading to interesting optoelectronic applications. In the bottom-up approach of building these atomically thin materials, atomic doping plays a crucial role. Here we demonstrate a single step CVD (chemical vapor deposition) growth procedure for obtaining binary alloys and heterostructures by tuning atomic composition. We show that a minute doping of tin during the growth phase of the Mo1-xWxS2 alloy system leads to formation of lateral and vertical heterostructure growth. High angle annular dark field scanning transmission electron microscopy (HAADF-STEM) imaging and density functional theory (DFT) calculations also support the modified stacking and growth mechanism due to the nonisomorphous Sn substitution. Our experiments demonstrate the possibility of growing heterostructures of TMD alloys whose spectral responses can be desirably tuned for various optoelectronic applications.
Original language | English |
---|---|
Pages (from-to) | 7431-7439 |
Number of pages | 9 |
Journal | Chemistry of Materials |
Volume | 29 |
Issue number | 17 |
DOIs | |
State | Published - Sep 12 2017 |
Funding
This work was supported by the MURI ARO program, Grant Number W911NF-11-1-0362, by FAME, one of six centers of STARnet, a Semiconductor Research Corporation program sponsored by MARCO and DARPA and also by the Air Force Office of Scientific Research (AFOSR) award BAA-AFOSR-2013-0001. This research used resources provided by the Navy DoD Supercomputing Resource Center. This research was partially supported by the Center for Nanophase Materials Sciences (CNMS), which is sponsored at ORNL by the Scientific User Facilities Division, Office of Basic Energy Sciences, U.S. Department of Energy (J.A.H. and J.C.I.). This manuscript has been authored by UT-Battelle, LLC under Contract No. DE-AC05-00OR22725 with the U.S. Department of Energy.
Funders | Funder number |
---|---|
Center for Nanophase Materials Sciences | |
FAME | |
MURI ARO | W911NF-11-1-0362 |
U.S. Department of Energy | |
Air Force Office of Scientific Research | BAA-AFOSR-2013-0001 |
Defense Advanced Research Projects Agency | |
Basic Energy Sciences | |
Oak Ridge National Laboratory | |
Microelectronics Advanced Research Corporation |