TY - JOUR
T1 - Persistent step-flow growth of strained films on vicinal substrates
AU - Hong, Wei
AU - Lee, Ho Nyung
AU - Yoon, Mina
AU - Christen, Hans M.
AU - Lowndes, Douglas H.
AU - Suo, Zhigang
AU - Zhang, Zhenyu
PY - 2005/8/26
Y1 - 2005/8/26
N2 - We propose a model of persistent step flow, emphasizing dominant kinetic processes and strain effects. Within this model, we construct a morphological phase diagram, delineating a regime of step flow from regimes of step bunching and island formation. In particular, we predict the existence of concurrent step bunching and island formation, a new growth mode that competes with step flow for phase space, and show that the deposition flux and temperature must be chosen within a window in order to achieve persistent step flow. The model rationalizes the diverse growth modes observed in pulsed laser deposition of SrRuO3 on SrTiO3.
AB - We propose a model of persistent step flow, emphasizing dominant kinetic processes and strain effects. Within this model, we construct a morphological phase diagram, delineating a regime of step flow from regimes of step bunching and island formation. In particular, we predict the existence of concurrent step bunching and island formation, a new growth mode that competes with step flow for phase space, and show that the deposition flux and temperature must be chosen within a window in order to achieve persistent step flow. The model rationalizes the diverse growth modes observed in pulsed laser deposition of SrRuO3 on SrTiO3.
UR - http://www.scopus.com/inward/record.url?scp=27144478903&partnerID=8YFLogxK
U2 - 10.1103/PhysRevLett.95.095501
DO - 10.1103/PhysRevLett.95.095501
M3 - Article
AN - SCOPUS:27144478903
SN - 0031-9007
VL - 95
JO - Physical Review Letters
JF - Physical Review Letters
IS - 9
M1 - 095501
ER -