Paramagnetic-to-antiferromagnetic phase transformation in sputter-deposited Ni-Mn thin films

Peter F. Ladwig, Ying Yang, Ling Ding, I. Fei Tsu, Y. Austin Chang

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

Sputter-deposited, equiatomic Ni-Mn thin films were observed to possess a metastable, nanocrystalline, chemically disordered, fcc (A1) structure. Grain growth and a phase change to a chemically ordered, antiferromagnetic L10 structure were identified by x-ray diffraction (XRD) and transmission electron microscopy (TEM). Differential scanning calorimetry (DSC) experiments revealed exothermic signals that correspond to the grain growth and phase transformation reactions. The enthalpy of transformation for the A1 to L10 phase change was calculated as -3.5 kJ/mol, which agrees with thermodynamic modeling. An activation energy of 139 kJ/mol was calculated for the phase transformation by the Kissinger method.

Original languageEnglish
Pages (from-to)1155-1159
Number of pages5
JournalJournal of Electronic Materials
Volume32
Issue number11
DOIs
StatePublished - Nov 2003
Externally publishedYes

Funding

The authors thank Chris Pelto for his review of this manuscript. This research is supported by Grant No. DE-FG02-99ER45777 from the Division of Materials Science, Office of Basic Energy Research, Department of Energy; Seagate Technology; and the Wisconsin Distinguished Professorship.

FundersFunder number
Office of Basic Energy Research
U.S. Department of Energy
Division of Materials Sciences and Engineering
Seagate Technology

    Keywords

    • Antiferromagnetic materials
    • Calorimetry
    • Grain growth
    • Magnetoresistance
    • Manganese alloys
    • Metastability
    • Nickel alloys
    • Phase transformation
    • Spin valves
    • Sputter deposition
    • Thin films

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