p-type ZnSe by nitrogen atom beam doping during molecular beam epitaxial growth

R. M. Park, M. B. Troffer, C. M. Rouleau, J. M. DePuydt, M. A. Haase

Research output: Contribution to journalArticlepeer-review

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Abstract

A novel approach to producing p-type ZnSe epitaxial layers is reported which involves nitrogen atom beam doping during molecular beam epitaxial growth. Net acceptor concentrations as large as 3.4×1017 cm -3 have been measured in nitrogen atom beam doped ZnSe/GaAs heteroepitaxial layers which represents the highest acceptor concentration reported to date for ZnSe:N epitaxial material grown by molecular beam epitaxy. In addition, light-emitting diodes based on ZnSe:N/ZnSe:Cl, p-n homojunctions have been found to exhibit dominant electroluminescence in the blue region of the visible spectrum at room temperature.

Original languageEnglish
Pages (from-to)2127-2129
Number of pages3
JournalApplied Physics Letters
Volume57
Issue number20
DOIs
StatePublished - 1990
Externally publishedYes

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