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Optimizing Inkless Printed Electronics with Machine Learning Models

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Inkless dry additive nanomanufacturing enables ink-free printing of electronics across diverse feedstock and substrates, but the high versatility and coupled parameter space can make tuning of print parameters a time-intensive, manual process. We demonstrate a fully autonomous printing capability that closes the loop between printing, measurement, and model-based decision making to drive the process toward a user-specified target resistance with minimal operator intervention. An active learning algorithm trade study was used to select modeling and optimization choices (surrogate model, acquisition strategy, and batch sizes) that efficiently captures our printing process while balancing convergence speed with print constraints. Using the chosen active learning model, the autonomous system iteratively proposes new parameter batches, executes prints, makes measurements, and updates its process model until the target is achieved. In validation on both silver and copper, the automated workflow has proven itself capable of mapping a four-dimensional print parameter space while achieving a targeted resistance in less than 30 printed lines and yielding a transferable parameter space map to utilize for future targets. Overall, this work establishes self-driving inkless printed electronics where resistance targeting and process learning occur in situ.

Original languageEnglish
Title of host publicationNanoscale and Quantum Materials
Subtitle of host publicationFrom Synthesis and Laser Processing to Applications 2026
EditorsAndrei V. Kabashin, Masoud Mahjouri-Samani, Ioanna Zergioti
PublisherSPIE
ISBN (Electronic)9781510696785
DOIs
StatePublished - Mar 5 2026
EventNanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications 2026 - San Francisco, United States
Duration: Jan 17 2026Jan 18 2026

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume13882
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceNanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications 2026
Country/TerritoryUnited States
CitySan Francisco
Period01/17/2601/18/26

Funding

This material is based upon work supported by the National Aeronautics and Space Administration (NASA) under grant nos. 80NSSC24K0999. Support for algorithm development was conducted as part of a user project at the Center for Nanophase Materials Sciences (CNMS), which is a US Department of Energy, Office of Science User Facility at Oak Ridge National Laboratory. This work was completed in part with resources provided by the Auburn University Easley Cluster. During the preparation of this work, the authors used the AI tool ChatGPT to improve the language and readability.

Keywords

  • Bayesian optimization
  • Inkless printed electronics
  • active learning
  • autonomous experimentation
  • digital twin
  • dry additive nanomanufacturing

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