Optimization of chemical vapor deposition parameters for fabrication of oxidation-resistant mullite coatings on silicon nitride

Svetlana M. Zemskova; Camille Y. Jones; Kevin M. Cooley; J. Allen Haynes

doi:10.1111/j.1151-2916.2004.tb07491.x

Optimization of chemical vapor deposition parameters for fabrication of oxidation-resistant mullite coatings on silicon nitride

Svetlana M. Zemskova
, Camille Y. Jones
, Kevin M. Cooley
, J. Allen Haynes

Surface Engineering and Tribology

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

Fabrication of mullite (3Al₂O₃·2SiO ₂) coatings by chemical vapor deposition (CVD) using AlCl ₃-SiCl₄-H₂-CO₂ gas mixtures was studied. The resultant CVD mullite coating microstructures were sensitive to gas-phase composition and deposition temperature. Chemical thermodynamic calculations performed on the AlCl₃-SiCl₄-H ₂-CO₂ system were used to predict an equilibrium CVD phase diagram. Results from the thermodynamic analysis, process optimization, and effects of various process parameters on coating morphology are discussed. Dense, adherent crystalline CVD mullite coatings ∼2 μm thick were successfully grown on Si₃N₄ substrates at 1000°C and 10.7 kPa total pressure. The resultant coatings were 001 textured and contained well-faceted grains ∼0.3-0.5 μm in size.

Original language	English
Pages (from-to)	2201-2207
Number of pages	7
Journal	Journal of the American Ceramic Society
Volume	87
Issue number	12
DOIs	https://doi.org/10.1111/j.1151-2916.2004.tb07491.x
State	Published - Dec 2004

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title = "Optimization of chemical vapor deposition parameters for fabrication of oxidation-resistant mullite coatings on silicon nitride",

abstract = "Fabrication of mullite (3Al2O3·2SiO 2) coatings by chemical vapor deposition (CVD) using AlCl 3-SiCl4-H2-CO2 gas mixtures was studied. The resultant CVD mullite coating microstructures were sensitive to gas-phase composition and deposition temperature. Chemical thermodynamic calculations performed on the AlCl3-SiCl4-H 2-CO2 system were used to predict an equilibrium CVD phase diagram. Results from the thermodynamic analysis, process optimization, and effects of various process parameters on coating morphology are discussed. Dense, adherent crystalline CVD mullite coatings ∼2 μm thick were successfully grown on Si3N4 substrates at 1000°C and 10.7 kPa total pressure. The resultant coatings were 001 textured and contained well-faceted grains ∼0.3-0.5 μm in size.",

author = "Zemskova, \{Svetlana M.\} and Jones, \{Camille Y.\} and Cooley, \{Kevin M.\} and Haynes, \{J. Allen\}",

year = "2004",

month = dec,

doi = "10.1111/j.1151-2916.2004.tb07491.x",

language = "English",

volume = "87",

pages = "2201--2207",

journal = "Journal of the American Ceramic Society",

issn = "0002-7820",

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number = "12",

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TY - JOUR

T1 - Optimization of chemical vapor deposition parameters for fabrication of oxidation-resistant mullite coatings on silicon nitride

AU - Zemskova, Svetlana M.

AU - Jones, Camille Y.

AU - Cooley, Kevin M.

AU - Haynes, J. Allen

PY - 2004/12

Y1 - 2004/12

N2 - Fabrication of mullite (3Al2O3·2SiO 2) coatings by chemical vapor deposition (CVD) using AlCl 3-SiCl4-H2-CO2 gas mixtures was studied. The resultant CVD mullite coating microstructures were sensitive to gas-phase composition and deposition temperature. Chemical thermodynamic calculations performed on the AlCl3-SiCl4-H 2-CO2 system were used to predict an equilibrium CVD phase diagram. Results from the thermodynamic analysis, process optimization, and effects of various process parameters on coating morphology are discussed. Dense, adherent crystalline CVD mullite coatings ∼2 μm thick were successfully grown on Si3N4 substrates at 1000°C and 10.7 kPa total pressure. The resultant coatings were 001 textured and contained well-faceted grains ∼0.3-0.5 μm in size.

AB - Fabrication of mullite (3Al2O3·2SiO 2) coatings by chemical vapor deposition (CVD) using AlCl 3-SiCl4-H2-CO2 gas mixtures was studied. The resultant CVD mullite coating microstructures were sensitive to gas-phase composition and deposition temperature. Chemical thermodynamic calculations performed on the AlCl3-SiCl4-H 2-CO2 system were used to predict an equilibrium CVD phase diagram. Results from the thermodynamic analysis, process optimization, and effects of various process parameters on coating morphology are discussed. Dense, adherent crystalline CVD mullite coatings ∼2 μm thick were successfully grown on Si3N4 substrates at 1000°C and 10.7 kPa total pressure. The resultant coatings were 001 textured and contained well-faceted grains ∼0.3-0.5 μm in size.

UR - https://www.scopus.com/pages/publications/12144265164

U2 - 10.1111/j.1151-2916.2004.tb07491.x

DO - 10.1111/j.1151-2916.2004.tb07491.x

M3 - Article

AN - SCOPUS:12144265164

SN - 0002-7820

VL - 87

SP - 2201

EP - 2207

JO - Journal of the American Ceramic Society

JF - Journal of the American Ceramic Society

IS - 12

ER -

Optimization of chemical vapor deposition parameters for fabrication of oxidation-resistant mullite coatings on silicon nitride

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