Optimization of chemical vapor deposition parameters for fabrication of oxidation-resistant mullite coatings on silicon nitride

Svetlana M. Zemskova, Camille Y. Jones, Kevin M. Cooley, J. Allen Haynes

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Fabrication of mullite (3Al2O3·2SiO 2) coatings by chemical vapor deposition (CVD) using AlCl 3-SiCl4-H2-CO2 gas mixtures was studied. The resultant CVD mullite coating microstructures were sensitive to gas-phase composition and deposition temperature. Chemical thermodynamic calculations performed on the AlCl3-SiCl4-H 2-CO2 system were used to predict an equilibrium CVD phase diagram. Results from the thermodynamic analysis, process optimization, and effects of various process parameters on coating morphology are discussed. Dense, adherent crystalline CVD mullite coatings ∼2 μm thick were successfully grown on Si3N4 substrates at 1000°C and 10.7 kPa total pressure. The resultant coatings were 001 textured and contained well-faceted grains ∼0.3-0.5 μm in size.

Original languageEnglish
Pages (from-to)2201-2207
Number of pages7
JournalJournal of the American Ceramic Society
Volume87
Issue number12
DOIs
StatePublished - Dec 2004

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