Optical spatial heterodyned interferometry for applications in semiconductor inspection and metrology

Kenneth W. Tobin, Philip R. Bingham

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations

Abstract

Interferometric imaging has the potential to extend the usefulness of optical microscopes by encoding small phase shifts that reveal information about topology and materials. At the Oak Ridge National Laboratory (ORNL), we have developed an optical Spatial Heterodyne Interferometry (SHI) method that captures reflection or transmission images containing both phase and amplitude information at a high rate of speed. By measuring the phase of a wavefront reflected off or transmitted through a surface, the relative surface heights and some materials properties can be determined. In this paper we briefly review a variety of application areas where this technology has been applied including semiconductor wafer inspection, photolithographic mask metrology and inspection, and we conclude with a discussion regarding future work to apply SHI to MEMS device characterization.

Original languageEnglish
Article number616203
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume6162
DOIs
StatePublished - 2006
EventInternational Conference on Lasers, Applications, and Technologies 2005 - Laser Sensing, Imaging and Information Technologies - St. Petersburg, Russian Federation
Duration: May 11 2005May 15 2005

Keywords

  • Holography
  • MEMS characterization
  • Photolithographic mask metrology
  • Semiconductor wafer inspection
  • Spatial Heterodyned Interferometry

Fingerprint

Dive into the research topics of 'Optical spatial heterodyned interferometry for applications in semiconductor inspection and metrology'. Together they form a unique fingerprint.

Cite this