TY - JOUR
T1 - Optical absorption and photosensitivity of N implanted silica
AU - Magruder, R. H.
AU - Weeks, R. A.
AU - Zuhr, R. A.
AU - Hensley, D. K.
PY - 1998/5
Y1 - 1998/5
N2 - Silica was implanted with N ions at 4 MeV with nominal doses of 0.1, 0.3, 1.0 and 3.0 × 1016 ions/cm2. Optical absorption, measured from 2.5 to 6.2 eV, had maxima at 5.0 and 5.9 eV whose amplitudes increased with increasing dose. The ratio of the maximum amplitudes of these two bands was invariant with dose. The sample implanted with 1 × 1016 ions/cm2 was exposed to 5 eV KrF excimer photons, 150 mJ/cm2 per 20 ns pulse for totals of 1.5, 15 and 30 J/cm2. Absorption decreased at 5.0, 5.9 and 6.2 eV for all exposures. The decrease in absorption revealed a band at ∼ 4.7 eV that did not bleach. Thes data are compared to similar data of B implanted silica and based on comparison effects specific to N and B are resolved. These differences are attributed to interactions of N with Si and B with O.
AB - Silica was implanted with N ions at 4 MeV with nominal doses of 0.1, 0.3, 1.0 and 3.0 × 1016 ions/cm2. Optical absorption, measured from 2.5 to 6.2 eV, had maxima at 5.0 and 5.9 eV whose amplitudes increased with increasing dose. The ratio of the maximum amplitudes of these two bands was invariant with dose. The sample implanted with 1 × 1016 ions/cm2 was exposed to 5 eV KrF excimer photons, 150 mJ/cm2 per 20 ns pulse for totals of 1.5, 15 and 30 J/cm2. Absorption decreased at 5.0, 5.9 and 6.2 eV for all exposures. The decrease in absorption revealed a band at ∼ 4.7 eV that did not bleach. Thes data are compared to similar data of B implanted silica and based on comparison effects specific to N and B are resolved. These differences are attributed to interactions of N with Si and B with O.
KW - Ion implantation
KW - Optical absorption
KW - Silica
UR - http://www.scopus.com/inward/record.url?scp=0032066829&partnerID=8YFLogxK
U2 - 10.1016/s0168-583x(98)00100-1
DO - 10.1016/s0168-583x(98)00100-1
M3 - Article
AN - SCOPUS:0032066829
SN - 0168-583X
VL - 141
SP - 575
EP - 579
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
IS - 1-4
ER -