Operation and applications of the boron cathodic arc ion source

J. M. Williams; C. C. Klepper; D. J. Chivers; R. C. Hazelton; J. H. Freeman

doi:10.1063/1.3033664

Operation and applications of the boron cathodic arc ion source

J. M. Williams, C. C. Klepper, D. J. Chivers, R. C. Hazelton, J. H. Freeman

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

8 Scopus citations

Abstract

The boron cathodic arc ion source has been developed with a view to several applications, particularly the problem of shallow junction doping in semiconductors. Research has included not only development and operation of the boron cathode, but other cathode materials as well. Applications have included a large deposition directed toward development of a neutron detector and another deposition for an orthopedic coating, as well as the shallow ion implantation function. Operational experience is described and information pertinent to commercial operation, extracted from these experiments, is presented.

Original language	English
Title of host publication	Ion Implantation Technology 2008 - 17th International Conference on Ion Implantation Technology, IIT 2008
Editors	Edmund G. Seebauer, Amitabh Jain, Yevgeniy V. Kondratenko, Susan B. Felch
Publisher	American Institute of Physics Inc.
Pages	469-472
Number of pages	4
ISBN (Electronic)	9780735405974
DOIs	https://doi.org/10.1063/1.3033664
State	Published - 2008
Externally published	Yes
Event	17th International Conference on Ion Implantation Technology, IIT 2008 - Monterey, United States Duration: Jun 8 2008 → Jun 13 2008

Publication series

Name	AIP Conference Proceedings
Volume	1066
ISSN (Print)	0094-243X
ISSN (Electronic)	1551-7616

Conference

Conference	17th International Conference on Ion Implantation Technology, IIT 2008
Country/Territory	United States
City	Monterey
Period	06/8/08 → 06/13/08

Funding

Sponsors: US Department of Energy, US Department of Defense, National Science Foundation, National Institutes of Health, Domestic Neutron Detection Office of DHS, Virginia's Center for Innovative Technology.

Keywords

Boron
Cathodic arc
Coatings
Ion implantation
Shallow junction doping
Vacuum arc

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10.1063/1.3033664

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Williams, J. M., Klepper, C. C., Chivers, D. J., Hazelton, R. C., & Freeman, J. H. (2008). Operation and applications of the boron cathodic arc ion source. In E. G. Seebauer, A. Jain, Y. V. Kondratenko, & S. B. Felch (Eds.), Ion Implantation Technology 2008 - 17th International Conference on Ion Implantation Technology, IIT 2008 (pp. 469-472). (AIP Conference Proceedings; Vol. 1066). American Institute of Physics Inc.. https://doi.org/10.1063/1.3033664

Williams, J. M. ; Klepper, C. C. ; Chivers, D. J. et al. / Operation and applications of the boron cathodic arc ion source. Ion Implantation Technology 2008 - 17th International Conference on Ion Implantation Technology, IIT 2008. editor / Edmund G. Seebauer ; Amitabh Jain ; Yevgeniy V. Kondratenko ; Susan B. Felch. American Institute of Physics Inc., 2008. pp. 469-472 (AIP Conference Proceedings).

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abstract = "The boron cathodic arc ion source has been developed with a view to several applications, particularly the problem of shallow junction doping in semiconductors. Research has included not only development and operation of the boron cathode, but other cathode materials as well. Applications have included a large deposition directed toward development of a neutron detector and another deposition for an orthopedic coating, as well as the shallow ion implantation function. Operational experience is described and information pertinent to commercial operation, extracted from these experiments, is presented.",

keywords = "Boron, Cathodic arc, Coatings, Ion implantation, Shallow junction doping, Vacuum arc",

author = "Williams, {J. M.} and Klepper, {C. C.} and Chivers, {D. J.} and Hazelton, {R. C.} and Freeman, {J. H.}",

note = "Publisher Copyright: {\textcopyright} 2008 American Institute of Physics.; 17th International Conference on Ion Implantation Technology, IIT 2008 ; Conference date: 08-06-2008 Through 13-06-2008",

year = "2008",

doi = "10.1063/1.3033664",

language = "English",

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editor = "Seebauer, {Edmund G.} and Amitabh Jain and Kondratenko, {Yevgeniy V.} and Felch, {Susan B.}",

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Williams, JM, Klepper, CC, Chivers, DJ, Hazelton, RC & Freeman, JH 2008, Operation and applications of the boron cathodic arc ion source. in EG Seebauer, A Jain, YV Kondratenko & SB Felch (eds), Ion Implantation Technology 2008 - 17th International Conference on Ion Implantation Technology, IIT 2008. AIP Conference Proceedings, vol. 1066, American Institute of Physics Inc., pp. 469-472, 17th International Conference on Ion Implantation Technology, IIT 2008, Monterey, United States, 06/8/08. https://doi.org/10.1063/1.3033664

Operation and applications of the boron cathodic arc ion source. / Williams, J. M.; Klepper, C. C.; Chivers, D. J. et al.
Ion Implantation Technology 2008 - 17th International Conference on Ion Implantation Technology, IIT 2008. ed. / Edmund G. Seebauer; Amitabh Jain; Yevgeniy V. Kondratenko; Susan B. Felch. American Institute of Physics Inc., 2008. p. 469-472 (AIP Conference Proceedings; Vol. 1066).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Freeman, J. H.

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AB - The boron cathodic arc ion source has been developed with a view to several applications, particularly the problem of shallow junction doping in semiconductors. Research has included not only development and operation of the boron cathode, but other cathode materials as well. Applications have included a large deposition directed toward development of a neutron detector and another deposition for an orthopedic coating, as well as the shallow ion implantation function. Operational experience is described and information pertinent to commercial operation, extracted from these experiments, is presented.

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KW - Cathodic arc

KW - Coatings

KW - Ion implantation

KW - Shallow junction doping

KW - Vacuum arc

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Williams JM, Klepper CC, Chivers DJ, Hazelton RC, Freeman JH. Operation and applications of the boron cathodic arc ion source. In Seebauer EG, Jain A, Kondratenko YV, Felch SB, editors, Ion Implantation Technology 2008 - 17th International Conference on Ion Implantation Technology, IIT 2008. American Institute of Physics Inc. 2008. p. 469-472. (AIP Conference Proceedings). doi: 10.1063/1.3033664

Operation and applications of the boron cathodic arc ion source

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