@inproceedings{6d560575b7a845a8acf1730e8cfc00de,
title = "Operation and applications of the boron cathodic arc ion source",
abstract = "The boron cathodic arc ion source has been developed with a view to several applications, particularly the problem of shallow junction doping in semiconductors. Research has included not only development and operation of the boron cathode, but other cathode materials as well. Applications have included a large deposition directed toward development of a neutron detector and another deposition for an orthopedic coating, as well as the shallow ion implantation function. Operational experience is described and information pertinent to commercial operation, extracted from these experiments, is presented.",
keywords = "Boron, Cathodic arc, Coatings, Ion implantation, Shallow junction doping, Vacuum arc",
author = "Williams, {J. M.} and Klepper, {C. C.} and Chivers, {D. J.} and Hazelton, {R. C.} and Freeman, {J. H.}",
note = "Publisher Copyright: {\textcopyright} 2008 American Institute of Physics.; 17th International Conference on Ion Implantation Technology, IIT 2008 ; Conference date: 08-06-2008 Through 13-06-2008",
year = "2008",
doi = "10.1063/1.3033664",
language = "English",
series = "AIP Conference Proceedings",
publisher = "American Institute of Physics Inc.",
pages = "469--472",
editor = "Seebauer, {Edmund G.} and Amitabh Jain and Kondratenko, {Yevgeniy V.} and Felch, {Susan B.}",
booktitle = "Ion Implantation Technology 2008 - 17th International Conference on Ion Implantation Technology, IIT 2008",
}