On-axis microscopes for the inelastic x-ray scattering beamline at NSLS-II

K. J. Gofron, Y. Q. Cai, D. S. Coburn, S. Antonelli, J. Flores, A. Suvorov

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

A novel on-axis X-ray microscope with 3 μm resolution, 3x magnification, and a working distance of 600 mm for in-situ sample alignment and X-ray beam visualization for the Inelastic X-ray Scattering (IXS) beamline at NSLS-II is presented. The microscope uses reflective optics, which minimizes dispersion, and allows imaging from Ultraviolet (UV) to Infrared (IR) with specifically chosen objective components (coatings, etc.). Additionally, a portable high resolution X-ray microscope for KB mirror alignment and X-ray beam characterization was developed.

Original languageEnglish
Title of host publicationProceedings of the 12th International Conference on Synchrotron Radiation Instrumentation, SRI 2015
EditorsOleg Chubar, Ignace Jarrige, Konstantine Kaznatcheev, Lisa Miller, Eli Stavitski, Toshiya Tanabe, Timur Shaftan, Qun Shen, Ronald Pindak, Christie Nelson, Sebastian Kalbfleisch, Juergen Thieme, Garth Williams, Martin Fuchs, Abdul Rumaiz, Jun Wang, Kenneth Evans-Lutterodt, Wah-Keat Lee, Sean McSweeney, Elio Vescovo
PublisherAmerican Institute of Physics Inc.
ISBN (Electronic)9780735413986
DOIs
StatePublished - Jul 27 2016
Externally publishedYes
Event12th International Conference on Synchrotron Radiation Instrumentation, SRI 2015 - New York, United States
Duration: Jul 6 2015Jul 10 2015

Publication series

NameAIP Conference Proceedings
Volume1741
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference12th International Conference on Synchrotron Radiation Instrumentation, SRI 2015
Country/TerritoryUnited States
CityNew York
Period07/6/1507/10/15

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