Non-porous low-k dielectric films based on a new structural amorphous fluoropolymer

Chao Yuan; Kaikai Jin; Kai Li; Shen Diao; Jiawei Tong; Qiang Fang

doi:10.1002/adma.201302021

Non-porous low-k dielectric films based on a new structural amorphous fluoropolymer

Chao Yuan, Kaikai Jin, Kai Li, Shen Diao, Jiawei Tong, Qiang Fang

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184 Scopus citations

Abstract

A non-porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10^-3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.

Original language	English
Pages (from-to)	4875-4878
Number of pages	4
Journal	Advanced Materials
Volume	25
Issue number	35
DOIs	https://doi.org/10.1002/adma.201302021
State	Published - Sep 20 2013

Keywords

dielectric constant
fluoropolymers
insulators
low k materials
thin solid films

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10.1002/adma.201302021

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title = "Non-porous low-k dielectric films based on a new structural amorphous fluoropolymer",

abstract = "A non-porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10-3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.",

keywords = "dielectric constant, fluoropolymers, insulators, low k materials, thin solid films",

author = "Chao Yuan and Kaikai Jin and Kai Li and Shen Diao and Jiawei Tong and Qiang Fang",

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T1 - Non-porous low-k dielectric films based on a new structural amorphous fluoropolymer

AU - Yuan, Chao

AU - Jin, Kaikai

AU - Li, Kai

AU - Diao, Shen

AU - Tong, Jiawei

AU - Fang, Qiang

PY - 2013/9/20

Y1 - 2013/9/20

N2 - A non-porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10-3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.

AB - A non-porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10-3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.

KW - dielectric constant

KW - fluoropolymers

KW - insulators

KW - low k materials

KW - thin solid films

UR - https://www.scopus.com/pages/publications/84884908394

U2 - 10.1002/adma.201302021

DO - 10.1002/adma.201302021

M3 - Article

AN - SCOPUS:84884908394

SN - 0935-9648

VL - 25

SP - 4875

EP - 4878

JO - Advanced Materials

JF - Advanced Materials

IS - 35

ER -

Non-porous low-k dielectric films based on a new structural amorphous fluoropolymer

Abstract

Keywords

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