Non-perturbative cathodoluminescence microscopy of beam-sensitive materials

Malcolm Bogroff; Gabriel Cowley; Ariel Nicastro; David Levy; Yueh Chun Wu; Nannan Mao; Tilo H. Yang; Tianyi Zhang; Jing Kong; Rama Vasudevan; Kyle Kelley; Benjamin J. Lawrie

doi:10.1515/nanoph-2024-0724

Non-perturbative cathodoluminescence microscopy of beam-sensitive materials

Malcolm Bogroff, Gabriel Cowley, Ariel Nicastro, David Levy, Yueh Chun Wu, Nannan Mao, Tilo H. Yang, Tianyi Zhang, Jing Kong, Rama Vasudevan, Kyle Kelley, Benjamin J. Lawrie

Research output: Contribution to journal › Article › peer-review

Abstract

Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.

Original language	English
Journal	Nanophotonics
DOIs	https://doi.org/10.1515/nanoph-2024-0724
State	Accepted/In press - 2025

Funding

This research was supported by the U.S. Department of Energy (DOE), Office of Science, Basic Energy Sciences, Materials Sciences and Engineering Division. CL microscopy and data analytics algorithms were supported by the Center for Nanophase Materials Sciences, which is a U.S. Department of Energy Office of Science User Facility. MB, GC, AN, and DL were supported by the U.S. Department of Energy, Office of Science, Office of Workforce Development for Teachers and Scientists (WDTS) under the Science Undergraduate Laboratory Internship program. This manuscript has been authored by UT-Battelle, LLC, under contract DE-AC05-00OR22725 with the DOE. The US government retains and the publisher, by accepting the article for publication, acknowledges that the US government retains a nonexclusive, paid-up, irrevocable, worldwide license to publish or reproduce the published form of this manuscript, or allow others to do so, for US government purposes. DOE will provide public access to these results of federally sponsored research in accordance with the DOE Public Access Plan ( https://energy.gov/downloads/doe-publicaccess-plan ).

Keywords

2D materials
cathodoluminescence
color centers

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10.1515/nanoph-2024-0724

Cite this

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title = "Non-perturbative cathodoluminescence microscopy of beam-sensitive materials",

abstract = "Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.",

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T1 - Non-perturbative cathodoluminescence microscopy of beam-sensitive materials

AU - Bogroff, Malcolm

AU - Cowley, Gabriel

AU - Nicastro, Ariel

AU - Levy, David

AU - Wu, Yueh Chun

AU - Mao, Nannan

AU - Yang, Tilo H.

AU - Zhang, Tianyi

AU - Kong, Jing

AU - Vasudevan, Rama

AU - Kelley, Kyle

AU - Lawrie, Benjamin J.

PY - 2025

Y1 - 2025

N2 - Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.

AB - Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.

KW - 2D materials

KW - cathodoluminescence

KW - color centers

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SN - 2192-8614

JO - Nanophotonics

JF - Nanophotonics

ER -

Non-perturbative cathodoluminescence microscopy of beam-sensitive materials

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Keywords

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