New strategies for improvement and implementation of the digital electrostatic e-beam array lithography (DEAL) concept

S. J. Randolph; L. R. Baylor; K. L. Klein; W. L. Gardner; R. J. Kasica; M. A. Guillorn; D. K. Hensley; H. M. Meyer; S. Islam; P. D. Rack; R. Rucker; T. Rahman; T. Grundman; T. Bigelow; S. A. Eliza; R. Vijayar; J. A. Moore; M. L. Simpson; M. N. Ericson

doi:10.1109/IVNC.2006.335410

New strategies for improvement and implementation of the digital electrostatic e-beam array lithography (DEAL) concept

S. J. Randolph
, L. R. Baylor
, K. L. Klein
, W. L. Gardner
, R. J. Kasica
, M. A. Guillorn
, D. K. Hensley
, H. M. Meyer
, S. Islam
, P. D. Rack
, R. Rucker
, T. Rahman
, T. Grundman
, T. Bigelow
, S. A. Eliza
, R. Vijayar
, J. A. Moore
, M. L. Simpson
, M. N. Ericson

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Original language	English
Title of host publication	IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium
Pages	165
Number of pages	1
DOIs	https://doi.org/10.1109/IVNC.2006.335410
State	Published - 2006
Event	19th International Vacuum Nanoelecronics Conference and 50th International Field Emission Symposium, IVNC and IFES 2006 - Guilin, China Duration: Jul 17 2006 → Jul 20 2006

Publication series

Name	IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium

Conference

Conference	19th International Vacuum Nanoelecronics Conference and 50th International Field Emission Symposium, IVNC and IFES 2006
Country/Territory	China
City	Guilin
Period	07/17/06 → 07/20/06

Access to Document

10.1109/IVNC.2006.335410

Cite this

Randolph, S. J., Baylor, L. R., Klein, K. L., Gardner, W. L., Kasica, R. J., Guillorn, M. A., Hensley, D. K., Meyer, H. M., Islam, S., Rack, P. D., Rucker, R., Rahman, T., Grundman, T., Bigelow, T., Eliza, S. A., Vijayar, R., Moore, J. A., Simpson, M. L., & Ericson, M. N. (2006). New strategies for improvement and implementation of the digital electrostatic e-beam array lithography (DEAL) concept. In IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium (pp. 165). Article 4134512 (IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium). https://doi.org/10.1109/IVNC.2006.335410

Randolph, S. J. ; Baylor, L. R. ; Klein, K. L. et al. / New strategies for improvement and implementation of the digital electrostatic e-beam array lithography (DEAL) concept. IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium. 2006. pp. 165 (IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium).

@inproceedings{d3bf4c204b5644cdb41f7e4a5a79654c,

title = "New strategies for improvement and implementation of the digital electrostatic e-beam array lithography (DEAL) concept",

author = "Randolph, \{S. J.\} and Baylor, \{L. R.\} and Klein, \{K. L.\} and Gardner, \{W. L.\} and Kasica, \{R. J.\} and Guillorn, \{M. A.\} and Hensley, \{D. K.\} and Meyer, \{H. M.\} and S. Islam and Rack, \{P. D.\} and R. Rucker and T. Rahman and T. Grundman and T. Bigelow and Eliza, \{S. A.\} and R. Vijayar and Moore, \{J. A.\} and Simpson, \{M. L.\} and Ericson, \{M. N.\}",

year = "2006",

doi = "10.1109/IVNC.2006.335410",

language = "English",

isbn = "1424404010",

series = "IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium",

pages = "165",

booktitle = "IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium",

note = "19th International Vacuum Nanoelecronics Conference and 50th International Field Emission Symposium, IVNC and IFES 2006 ; Conference date: 17-07-2006 Through 20-07-2006",

}

Randolph, SJ, Baylor, LR, Klein, KL, Gardner, WL, Kasica, RJ, Guillorn, MA, Hensley, DK, Meyer, HM, Islam, S, Rack, PD, Rucker, R, Rahman, T, Grundman, T, Bigelow, T, Eliza, SA, Vijayar, R, Moore, JA, Simpson, ML & Ericson, MN 2006, New strategies for improvement and implementation of the digital electrostatic e-beam array lithography (DEAL) concept. in IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium., 4134512, IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium, pp. 165, 19th International Vacuum Nanoelecronics Conference and 50th International Field Emission Symposium, IVNC and IFES 2006, Guilin, China, 07/17/06. https://doi.org/10.1109/IVNC.2006.335410

New strategies for improvement and implementation of the digital electrostatic e-beam array lithography (DEAL) concept. / Randolph, S. J.; Baylor, L. R.; Klein, K. L. et al.
IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium. 2006. p. 165 4134512 (IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - New strategies for improvement and implementation of the digital electrostatic e-beam array lithography (DEAL) concept

AU - Randolph, S. J.

AU - Baylor, L. R.

AU - Klein, K. L.

AU - Gardner, W. L.

AU - Kasica, R. J.

AU - Guillorn, M. A.

AU - Hensley, D. K.

AU - Meyer, H. M.

AU - Islam, S.

AU - Rack, P. D.

AU - Rucker, R.

AU - Rahman, T.

AU - Grundman, T.

AU - Bigelow, T.

AU - Eliza, S. A.

AU - Vijayar, R.

AU - Moore, J. A.

AU - Simpson, M. L.

AU - Ericson, M. N.

PY - 2006

Y1 - 2006

UR - https://www.scopus.com/pages/publications/48649100337

U2 - 10.1109/IVNC.2006.335410

DO - 10.1109/IVNC.2006.335410

M3 - Conference contribution

AN - SCOPUS:48649100337

SN - 1424404010

SN - 9781424404018

T3 - IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium

SP - 165

BT - IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium

T2 - 19th International Vacuum Nanoelecronics Conference and 50th International Field Emission Symposium, IVNC and IFES 2006

Y2 - 17 July 2006 through 20 July 2006

ER -

Randolph SJ, Baylor LR, Klein KL, Gardner WL, Kasica RJ, Guillorn MA et al. New strategies for improvement and implementation of the digital electrostatic e-beam array lithography (DEAL) concept. In IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium. 2006. p. 165. 4134512. (IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium). doi: 10.1109/IVNC.2006.335410

New strategies for improvement and implementation of the digital electrostatic e-beam array lithography (DEAL) concept

Publication series

Conference

Access to Document

Other files and links

Cite this