Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme ultraviolet lithography
Vivek M. Prabhu, Shuhui Kang, Jing Sha, Peter V. Bonnesen, Sushil Satija, Wen Li Wu, Christopher K. Ober
Research output: Contribution to journal › Article › peer-review
14Scopus
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