Nanotransfer printing using plasma etched silicon stamps and mediated by in situ deposited fluoropolymer

Deepak Bhandari; Ivan I. Kravchenko; Nickolay V. Lavrik; Michael J. Sepaniak

doi:10.1021/ja201497a

Nanotransfer printing using plasma etched silicon stamps and mediated by in situ deposited fluoropolymer

Deepak Bhandari, Ivan I. Kravchenko, Nickolay V. Lavrik, Michael J. Sepaniak

Nanofabrication Research Laboratory

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

This communication describes a simple method that uses a thin film of octafluorocyclobutane (OFCB) polymer for efficient nanoscale transfer printing (nTP). Plasma polymerization of OFCB produces a Teflon-like fluoropolymer which strongly adheres and conformally covers a 3-D inorganic stamp. The inherently low surface energy of in situ deposited OFCB polymer on nanoscale silicon features is demonstrated as a unique nanocomposite stamp to fabricate various test structures with improved nTP feature resolution down to sub-100 nm.

Original language	English
Pages (from-to)	7722-7724
Number of pages	3
Journal	Journal of the American Chemical Society
Volume	133
Issue number	20
DOIs	https://doi.org/10.1021/ja201497a
State	Published - May 25 2011

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10.1021/ja201497a

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@article{d4f858299d254a2cafa6dfe35d5ba5c1,

title = "Nanotransfer printing using plasma etched silicon stamps and mediated by in situ deposited fluoropolymer",

abstract = "This communication describes a simple method that uses a thin film of octafluorocyclobutane (OFCB) polymer for efficient nanoscale transfer printing (nTP). Plasma polymerization of OFCB produces a Teflon-like fluoropolymer which strongly adheres and conformally covers a 3-D inorganic stamp. The inherently low surface energy of in situ deposited OFCB polymer on nanoscale silicon features is demonstrated as a unique nanocomposite stamp to fabricate various test structures with improved nTP feature resolution down to sub-100 nm.",

author = "Deepak Bhandari and Kravchenko, {Ivan I.} and Lavrik, {Nickolay V.} and Sepaniak, {Michael J.}",

year = "2011",

month = may,

day = "25",

doi = "10.1021/ja201497a",

language = "English",

volume = "133",

pages = "7722--7724",

journal = "Journal of the American Chemical Society",

issn = "0002-7863",

publisher = "American Chemical Society",

number = "20",

}

TY - JOUR

T1 - Nanotransfer printing using plasma etched silicon stamps and mediated by in situ deposited fluoropolymer

AU - Bhandari, Deepak

AU - Kravchenko, Ivan I.

AU - Lavrik, Nickolay V.

AU - Sepaniak, Michael J.

PY - 2011/5/25

Y1 - 2011/5/25

N2 - This communication describes a simple method that uses a thin film of octafluorocyclobutane (OFCB) polymer for efficient nanoscale transfer printing (nTP). Plasma polymerization of OFCB produces a Teflon-like fluoropolymer which strongly adheres and conformally covers a 3-D inorganic stamp. The inherently low surface energy of in situ deposited OFCB polymer on nanoscale silicon features is demonstrated as a unique nanocomposite stamp to fabricate various test structures with improved nTP feature resolution down to sub-100 nm.

AB - This communication describes a simple method that uses a thin film of octafluorocyclobutane (OFCB) polymer for efficient nanoscale transfer printing (nTP). Plasma polymerization of OFCB produces a Teflon-like fluoropolymer which strongly adheres and conformally covers a 3-D inorganic stamp. The inherently low surface energy of in situ deposited OFCB polymer on nanoscale silicon features is demonstrated as a unique nanocomposite stamp to fabricate various test structures with improved nTP feature resolution down to sub-100 nm.

UR - http://www.scopus.com/inward/record.url?scp=79957736752&partnerID=8YFLogxK

U2 - 10.1021/ja201497a

DO - 10.1021/ja201497a

M3 - Article

AN - SCOPUS:79957736752

SN - 0002-7863

VL - 133

SP - 7722

EP - 7724

JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

IS - 20

ER -

Nanotransfer printing using plasma etched silicon stamps and mediated by in situ deposited fluoropolymer

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