TY - JOUR
T1 - Morphology and microstructure of (111) crystalline CeO2 films grown on amorphous SiO2 substrates by pulsed-laser ablation
AU - Zhu, S.
AU - Lowndes, Douglas H.
AU - Budai, J. D.
AU - Thundat, T.
AU - Norton, D. P.
AU - Warmack, R. J.
PY - 1995
Y1 - 1995
N2 - The surface morphology and microstructure of (111)-oriented CeO2 thin films, grown on amorphous fused silica (SiO2) substrates by low-energy-ion-beam assisted pulsed laser ablation, have been studied by atomic force microscopy (AFM) and x-ray diffraction (XRD). These CeO2 films are aligned with respect to a single in-plane axis despite being deposited on an amorphous substrate. There is a honeycomb-like growth morphology to the films and island-growth can be observed in thicker films. These islands, inside of which are high density of honeycomb-like clusters, are separated by a void network with approx.700nm width. However, on the surface of the thinnest film (approx.3nm), only very small clusters (diameter <60nm) appear, and the boundaries of the void network are undefined, which implies that the film is just beginning to coalesce into clusters (grains). The combined AFM images and XRD pattern suggest these clusters probably are the initial seeds for the subsequent island growth. Based on these results, the growth mechanism of oriented CeO2 films on amorphous fused silica substrates is discussed.
AB - The surface morphology and microstructure of (111)-oriented CeO2 thin films, grown on amorphous fused silica (SiO2) substrates by low-energy-ion-beam assisted pulsed laser ablation, have been studied by atomic force microscopy (AFM) and x-ray diffraction (XRD). These CeO2 films are aligned with respect to a single in-plane axis despite being deposited on an amorphous substrate. There is a honeycomb-like growth morphology to the films and island-growth can be observed in thicker films. These islands, inside of which are high density of honeycomb-like clusters, are separated by a void network with approx.700nm width. However, on the surface of the thinnest film (approx.3nm), only very small clusters (diameter <60nm) appear, and the boundaries of the void network are undefined, which implies that the film is just beginning to coalesce into clusters (grains). The combined AFM images and XRD pattern suggest these clusters probably are the initial seeds for the subsequent island growth. Based on these results, the growth mechanism of oriented CeO2 films on amorphous fused silica substrates is discussed.
UR - http://www.scopus.com/inward/record.url?scp=0029536655&partnerID=8YFLogxK
M3 - Conference article
AN - SCOPUS:0029536655
SN - 0272-9172
VL - 354
SP - 603
EP - 608
JO - Materials Research Society Symposium - Proceedings
JF - Materials Research Society Symposium - Proceedings
T2 - Proceedings of the 1994 MRS Fall Meeting
Y2 - 28 November 1994 through 30 November 1994
ER -