Molecular sidebands of refractory elements for ISOL

A. Kronenberg, E. H. Spejewski, H. K. Carter, B. Mervin, C. Jost, D. W. Stracener, S. Lapi, T. Bray

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

The formation of molecular sidebands of refractory elements, such as V, Re, Zr, Mo, Tc, is discussed. The focus is on in situ sideband formation and its advantage for the release process. An atomic 48V beam has been produced in a two step process, forming the oxide in situ, transporting it through the target-ion source as a chloride and destroying the chlorine sideband in the ion source. The sideband formation of Re, Zr, Mo, Tc is discussed.

Original languageEnglish
Pages (from-to)4252-4256
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume266
Issue number19-20
DOIs
StatePublished - Oct 2008

Funding

We thank Peter Dorhaut and Benny Chan for the preparation of the UB 4 , Jim Kiggans for making targets and characterizing them. We also thank the students participating in this project. This research was sponsored by the National Nuclear Security Administration under the Stewardship Science Academic Alliance program through DOE Cooperation Agreement #DE-FC03-3NA00143.

FundersFunder number
U.S. Department of Energy-FC03-3NA00143
National Nuclear Security Administration

    Keywords

    • Isotope separation
    • Nuclear chemistry
    • Radioactive ion beams
    • Radiochemistry
    • Target and ion sources

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