Abstract
The formation of molecular sidebands of refractory elements, such as V, Re, Zr, Mo, Tc, is discussed. The focus is on in situ sideband formation and its advantage for the release process. An atomic 48V beam has been produced in a two step process, forming the oxide in situ, transporting it through the target-ion source as a chloride and destroying the chlorine sideband in the ion source. The sideband formation of Re, Zr, Mo, Tc is discussed.
Original language | English |
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Pages (from-to) | 4252-4256 |
Number of pages | 5 |
Journal | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
Volume | 266 |
Issue number | 19-20 |
DOIs | |
State | Published - Oct 2008 |
Funding
We thank Peter Dorhaut and Benny Chan for the preparation of the UB 4 , Jim Kiggans for making targets and characterizing them. We also thank the students participating in this project. This research was sponsored by the National Nuclear Security Administration under the Stewardship Science Academic Alliance program through DOE Cooperation Agreement #DE-FC03-3NA00143.
Funders | Funder number |
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U.S. Department of Energy | -FC03-3NA00143 |
National Nuclear Security Administration |
Keywords
- Isotope separation
- Nuclear chemistry
- Radioactive ion beams
- Radiochemistry
- Target and ion sources