Molecular sidebands of refractory elements for ISOL

A. Kronenberg; E. H. Spejewski; H. K. Carter; B. Mervin; C. Jost; D. W. Stracener; S. Lapi; T. Bray

doi:10.1016/j.nimb.2008.05.147

Molecular sidebands of refractory elements for ISOL

A. Kronenberg, E. H. Spejewski, H. K. Carter, B. Mervin, C. Jost, D. W. Stracener, S. Lapi, T. Bray

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

The formation of molecular sidebands of refractory elements, such as V, Re, Zr, Mo, Tc, is discussed. The focus is on in situ sideband formation and its advantage for the release process. An atomic ⁴⁸V beam has been produced in a two step process, forming the oxide in situ, transporting it through the target-ion source as a chloride and destroying the chlorine sideband in the ion source. The sideband formation of Re, Zr, Mo, Tc is discussed.

Original language	English
Pages (from-to)	4252-4256
Number of pages	5
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	266
Issue number	19-20
DOIs	https://doi.org/10.1016/j.nimb.2008.05.147
State	Published - Oct 2008

Funding

We thank Peter Dorhaut and Benny Chan for the preparation of the UB 4 , Jim Kiggans for making targets and characterizing them. We also thank the students participating in this project. This research was sponsored by the National Nuclear Security Administration under the Stewardship Science Academic Alliance program through DOE Cooperation Agreement #DE-FC03-3NA00143.

Keywords

Isotope separation
Nuclear chemistry
Radioactive ion beams
Radiochemistry
Target and ion sources

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abstract = "The formation of molecular sidebands of refractory elements, such as V, Re, Zr, Mo, Tc, is discussed. The focus is on in situ sideband formation and its advantage for the release process. An atomic 48V beam has been produced in a two step process, forming the oxide in situ, transporting it through the target-ion source as a chloride and destroying the chlorine sideband in the ion source. The sideband formation of Re, Zr, Mo, Tc is discussed.",

keywords = "Isotope separation, Nuclear chemistry, Radioactive ion beams, Radiochemistry, Target and ion sources",

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T1 - Molecular sidebands of refractory elements for ISOL

AU - Kronenberg, A.

AU - Spejewski, E. H.

AU - Carter, H. K.

AU - Mervin, B.

AU - Jost, C.

AU - Stracener, D. W.

AU - Lapi, S.

AU - Bray, T.

PY - 2008/10

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AB - The formation of molecular sidebands of refractory elements, such as V, Re, Zr, Mo, Tc, is discussed. The focus is on in situ sideband formation and its advantage for the release process. An atomic 48V beam has been produced in a two step process, forming the oxide in situ, transporting it through the target-ion source as a chloride and destroying the chlorine sideband in the ion source. The sideband formation of Re, Zr, Mo, Tc is discussed.

KW - Isotope separation

KW - Nuclear chemistry

KW - Radioactive ion beams

KW - Radiochemistry

KW - Target and ion sources

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SN - 0168-583X

VL - 266

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JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

IS - 19-20

ER -

Molecular sidebands of refractory elements for ISOL

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