Abstract
Molecular dynamic simulation of thermal nanoimprint lithographic (T-NIL) process has been performed to study the effect of the polymer molecular size on polymer flow for various mold cavity geometries. First, simulations of T-NIL process with several temperature settings were performed to determine the optimal temperature for the process. Simulations were also done to obtain the size of polymer molecule represented by the radius of gyration (R g). Then, the relation between the R g of the polymer and the processibility was investigated for various mold cavity sizes. The results showed that there existed a minimum cavity size for the R g value of polymer for successful processing. Based on the results, it was shown that the polymer cannot be well patterned if the mold cavity size becomes 2R g of polymer or smaller. Therefore, it could be concluded that the R g value of a polymer can be a good indicating parameter when choosing the suitable pattern size.
| Original language | English |
|---|---|
| Pages (from-to) | 421-430 |
| Number of pages | 10 |
| Journal | Tribology Letters |
| Volume | 49 |
| Issue number | 2 |
| DOIs | |
| State | Published - Feb 2013 |
| Externally published | Yes |
Funding
funded by the Ministry of Education, Science and Technology (2012-0007417). Acknowledgments This research was supported by the Korea Research Foundation Grant funded by the Korean Government (MOEHRD) (Grant KRF-J03003), WCU (World Class University) program (R31-2008-000-10083-0), and by Basic Science Research Program through the National Research Foundation of Korea (NRF)
Keywords
- Molecular dynamics
- NIL
- Nano-pattern
- Polymer
- Radius of gyration (R )