Modeling of dynamical processes in laser ablation

J. N. Leboeuf, K. R. Chen, J. M. Donato, D. B. Geohegan, C. L. Liu, A. A. Puretzky, R. F. Wood

Research output: Contribution to journalArticlepeer-review

68 Scopus citations

Abstract

Various physics and computational approaches have been developed to globally characterize phenomena important for film growth by pulsed-laser deposition of materials. These include thermal models of laser-solid target interactions that initiate the vapor plume, plume ionization and heating through laser absorption beyond local thermodynamic equilibrium mechanisms, hydrodynamic and collisional descriptions of plume transport, and molecular dynamics models of the interaction of plume particles with the deposition substrate.

Original languageEnglish
Pages (from-to)14-23
Number of pages10
JournalApplied Surface Science
Volume96-98
DOIs
StatePublished - Apr 1996

Funding

This research is sponsored at the Oak Ridge National Laboratory (ORNL) by Laboratory Directed Research and Development Funds and by the Division of Materials Sciences, U.S. Department of Energy, under contract DE-AC05840R21400 with Lockheed Martin Energy Systems, Inc. K.R. Chen and Chun-Li Liu are supported by an appointment to the ORNL Research Associate Program, administered jointly by the Oak Ridge Institute for Science and Education and ORNL. Alex Puretzky is on assignment to ORNL from the Institute of Spectroscopy, Russian Academy of Sciences, Troitsk, Russia.

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