Modeling and simulation of short-channel MOSFETs operating in deep weak inversion

J. M. Vann, M. C. Smith, M. L. Simpson, C. E. Thomas, M. J. Paulus, J. A. Moore, L. R. Baylor, J. M. Rochelle, D. H. Lowndes, D. B. Geohegan, G. E. Jellison, V. I. Merkulov, A. A. Puretzky, E. Voelkl

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

As circuit densities continue to increase and battery operated systems demand lower power operation, more designs will incorporate small geometry (short and narrow) MOSFETs operating in deep weak inversion. Our research into massively parallel electron emitter arrays for lithographic applications has included the design of short-channel MOSFETs operating at currents as small as 100 pA. Simulation of these weakly inverted, small geometry devices required the development of appropriate model parameters. We report our method for determining BSIM model parameters for short channel devices operating in the deep subthreshold region. In addition we show our modeling results with a commercial 0.5 μm CMOS process.

Original languageEnglish
Title of host publicationProceedings - 1998 Midwest Symposium on Circuits and Systems, MWSCAS 1998
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages24-27
Number of pages4
ISBN (Electronic)0818689145
DOIs
StatePublished - 1998
Event1998 Midwest Symposium on Circuits and Systems, MWSCAS 1998 - Notre Dame, United States
Duration: Aug 9 1998Aug 12 1998

Publication series

NameMidwest Symposium on Circuits and Systems
ISSN (Print)1548-3746

Conference

Conference1998 Midwest Symposium on Circuits and Systems, MWSCAS 1998
Country/TerritoryUnited States
CityNotre Dame
Period08/9/9808/12/98

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