Microstructural evolution of protective La-Cr-O films studied by transmission electron microscopy

Miaofang Chi; Nigel Browning; Nina Orlovskaya

doi:10.1007/s10008-006-0138-7

Microstructural evolution of protective La-Cr-O films studied by transmission electron microscopy

Miaofang Chi, Nigel Browning, Nina Orlovskaya

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Transmission Electron Microscopy (TEM) and Electron Energy Loss Spectroscopy (EELS) were performed to study the microstructural evolution of La-Cr-O thin films deposited by radio frequency (RF)-magnetron sputtering on stainless steel substrates. Chromium L edges and oxygen K edges are analyzed to determine the valence states of the chromium and elucidate the phase evolution of the thin film. The as-deposited amorphous thin film crystallized to LaCrO₄ and finally transformed to the LaCrO₃ stable phase during annealing at 800°C. An intermediate Cr/Mn oxide layer was formed in all annealed samples. The thickness of this oxide layer stabilizes after 700°C, which indicates that the LaCrO₃ thin film plays a role in inhibiting the growth of an oxide layer on the metal surface.

Original language	English
Pages (from-to)	659-662
Number of pages	4
Journal	Journal of Solid State Electrochemistry
Volume	10
Issue number	8
DOIs	https://doi.org/10.1007/s10008-006-0138-7
State	Published - Aug 2006
Externally published	Yes

Keywords

EELS
Interconnect material
La-Cr-O thin films
TEM

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10.1007/s10008-006-0138-7

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title = "Microstructural evolution of protective La-Cr-O films studied by transmission electron microscopy",

abstract = "Transmission Electron Microscopy (TEM) and Electron Energy Loss Spectroscopy (EELS) were performed to study the microstructural evolution of La-Cr-O thin films deposited by radio frequency (RF)-magnetron sputtering on stainless steel substrates. Chromium L edges and oxygen K edges are analyzed to determine the valence states of the chromium and elucidate the phase evolution of the thin film. The as-deposited amorphous thin film crystallized to LaCrO4 and finally transformed to the LaCrO3 stable phase during annealing at 800°C. An intermediate Cr/Mn oxide layer was formed in all annealed samples. The thickness of this oxide layer stabilizes after 700°C, which indicates that the LaCrO3 thin film plays a role in inhibiting the growth of an oxide layer on the metal surface.",

keywords = "EELS, Interconnect material, La-Cr-O thin films, TEM",

author = "Miaofang Chi and Nigel Browning and Nina Orlovskaya",

year = "2006",

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doi = "10.1007/s10008-006-0138-7",

language = "English",

volume = "10",

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journal = "Journal of Solid State Electrochemistry",

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T1 - Microstructural evolution of protective La-Cr-O films studied by transmission electron microscopy

AU - Chi, Miaofang

AU - Browning, Nigel

AU - Orlovskaya, Nina

PY - 2006/8

Y1 - 2006/8

N2 - Transmission Electron Microscopy (TEM) and Electron Energy Loss Spectroscopy (EELS) were performed to study the microstructural evolution of La-Cr-O thin films deposited by radio frequency (RF)-magnetron sputtering on stainless steel substrates. Chromium L edges and oxygen K edges are analyzed to determine the valence states of the chromium and elucidate the phase evolution of the thin film. The as-deposited amorphous thin film crystallized to LaCrO4 and finally transformed to the LaCrO3 stable phase during annealing at 800°C. An intermediate Cr/Mn oxide layer was formed in all annealed samples. The thickness of this oxide layer stabilizes after 700°C, which indicates that the LaCrO3 thin film plays a role in inhibiting the growth of an oxide layer on the metal surface.

AB - Transmission Electron Microscopy (TEM) and Electron Energy Loss Spectroscopy (EELS) were performed to study the microstructural evolution of La-Cr-O thin films deposited by radio frequency (RF)-magnetron sputtering on stainless steel substrates. Chromium L edges and oxygen K edges are analyzed to determine the valence states of the chromium and elucidate the phase evolution of the thin film. The as-deposited amorphous thin film crystallized to LaCrO4 and finally transformed to the LaCrO3 stable phase during annealing at 800°C. An intermediate Cr/Mn oxide layer was formed in all annealed samples. The thickness of this oxide layer stabilizes after 700°C, which indicates that the LaCrO3 thin film plays a role in inhibiting the growth of an oxide layer on the metal surface.

KW - EELS

KW - Interconnect material

KW - La-Cr-O thin films

KW - TEM

UR - https://www.scopus.com/pages/publications/33745202847

U2 - 10.1007/s10008-006-0138-7

DO - 10.1007/s10008-006-0138-7

M3 - Article

AN - SCOPUS:33745202847

SN - 1432-8488

VL - 10

SP - 659

EP - 662

JO - Journal of Solid State Electrochemistry

JF - Journal of Solid State Electrochemistry

IS - 8

ER -

Microstructural evolution of protective La-Cr-O films studied by transmission electron microscopy

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