Abstract
The field emission (FE) properties of isolated, deterministically grown vertically aligned carbon nanotubes and carbon nanofibers (VACNFs) were studied using a scanning current probe. Processing experiments were made with the VACNFs and show that they can survive CHF3-based reactive ion etching (RIE) and plasma enhanced chemical vapor deposition (PECVD) SiO2 deposition and removal. This allowed to develop a wafer scale production process for VACNF-based FEAs that uses standard microfabrication techniques and offers several possibilities for variation.
Original language | English |
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Pages (from-to) | 2598-2601 |
Number of pages | 4 |
Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 19 |
Issue number | 6 |
DOIs | |
State | Published - Nov 2001 |