Abstract
Zirconia coatings were produced by reactive d.c. magnetron sputter deposition using a system with multiple sputter sources and a biased substrate stage. Crystal structure and phase stability of the coatings were investigated by X-ray diffraction (XRD) and transmission electron microscopy (TEM). Tetragonal zirconia with either a random orientation or a highly (111) preferred orientation was deposited when a substrate bias was applied, whereas coatings grown with no substrate bias had the equilibrium monoclinic structure. It was revealed that bias sputtering effectively decreased crystallite size in the as-deposited coatings, which resulted in room temperature stabilization of the metastable tetragonal phase. XRD analysis of annealed coatings showed that the volume fraction and stability of the tetragonal phase was strongly dependent on substrate bias and annealing temperature.
| Original language | English |
|---|---|
| Pages (from-to) | 109-117 |
| Number of pages | 9 |
| Journal | Surface and Coatings Technology |
| Volume | 135 |
| Issue number | 2-3 |
| DOIs | |
| State | Published - Jan 15 2001 |
Funding
The authors would like to thank T. Besmann, C.J. Rawn and M.J. Lance at ORNL for helpful reviews and discussions. This project was partially supported by funding from the Assistant Secretary for Energy Efficiency and Renewable Energy, Office of Transportation Technologies, as part of the High Temperature Materials Laboratory Fellowship Program, Oak Ridge National Laboratory, managed by Lockheed Martin Energy Research Corp. for the US Department of Energy under contract number DE-AC05-96OR22464.