Skip to main navigation Skip to search Skip to main content

Measurement of the velocity of the crystal-liquid interface in pulsed laser annealing of Si

  • G. J. Galvin
  • , M. O. Thompson
  • , J. W. Mayer
  • , R. B. Hammond
  • , N. Paulter
  • , P. S. Peercy

Research output: Contribution to journalArticlepeer-review

127 Scopus citations

Abstract

The conductance of Au-doped Si single crystals was measured during irradiation with 30-nsec Q-switched ruby-laser pulses at energy densities above the Si melting threshold (∼0.9 J/cm2). The sample conductance is determined primarily by the thickness of the molten layer so that the solid-liquid interface velocity can be found from the current transient. The interface velocity during crystallization was found to be 2.7±0.1 m/sec, in close agreement with calculated values based on a heat-flow model.

Original languageEnglish
Pages (from-to)33-36
Number of pages4
JournalPhysical Review Letters
Volume48
Issue number1
DOIs
StatePublished - 1982
Externally publishedYes

Fingerprint

Dive into the research topics of 'Measurement of the velocity of the crystal-liquid interface in pulsed laser annealing of Si'. Together they form a unique fingerprint.

Cite this