Materials analysis using sputter initiated resonance ionization spectroscopy

J. E. Parks, D. W. Beekman, H. W. Schmitt, E. H. Taylor

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

Resonance Ionization Spectroscopy (RIS) is a sensitive and selective ionization technique capable of single atom detection. This technique has been applied to the trace element analysis of solids in a process called Sputter Initiated Resonance Ionization Spectroscopy (SIRIS). Here we briefly review RIS and SIRIS. Recent results are presented for measurements of boron concentrations down to the ppm level in standard steel and silicon samples. Some preliminary results are also presented for uranium and uranium compounds. A detection efficiency for SIRIS is reported which will make possible a sensitivity of 2 ppb.

Original languageEnglish
Pages (from-to)280-284
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume10-11
Issue numberPART 1
DOIs
StatePublished - May 15 1985
Externally publishedYes

Funding

The partial support of this work by the Nuclear Regulatory Commission is gratefully acknowledged.

FundersFunder number
U.S. Nuclear Regulatory Commission

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