Making ICRF power compatible with a high-Z wall in ASDEX Upgrade

V. Bobkov, D. Aguiam, R. Bilato, S. Brezinsek, L. Colas, H. Faugel, H. Fünfgelder, A. Herrmann, J. Jacquot, A. Kallenbach, D. Milanesio, R. Maggiora, R. Neu, J. M. Noterdaeme, R. Ochoukov, S. Potzel, T. Pütterich, A. Silva, W. Tierens, A. TucciloO. Tudisco, Y. Wang, Q. Yang, W. Zhang

Research output: Contribution to journalArticlepeer-review

62 Scopus citations

Abstract

A comparison of the ASDEX Upgrade 3-strap ICRF antenna data with the linear electro-magnetic TOPICA calculations is presented. The comparison substantiates a reduction of the local electric field at the radially protruding plasma-facing elements of the antenna as a relevant approach for minimizing tungsten (W) sputtering in conditions when the slow wave is strongly evanescent. The measured reaction of the time-averaged RF current at the antenna limiters to the antenna feeding variations is less sensitive than predicted by the calculations. This is likely to have been caused by temporal and spatial fluctuations in the 3D plasma density distribution affected by local non-linear interactions. The 3-strap antenna with the W-coated limiters produces drastically less W sputtering compared to the W-coated 2-strap antennas. This is consistent with the non-linear asymptotic SSWICH-SW calculations for RF sheaths.

Original languageEnglish
Article number014022
JournalPlasma Physics and Controlled Fusion
Volume59
Issue number1
DOIs
StatePublished - Jan 2017
Externally publishedYes

Funding

This work has been carried out within the framework of the EUROfusion Consortium and has received funding from the EURATOM research and training programme 20142018 under grant agreement No. 633053. The views and opinions expressed herein do not necessarily reflect those of the European Commission.

FundersFunder number
EURATOM research and training programme 20142018
Horizon 2020 Framework Programme633053
European Commission

    Keywords

    • ASDEX Upgrade
    • ICRF
    • RF sheath
    • SSWICH
    • TOPICA
    • W sputtering
    • antenna

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