Low-cost combustion chemical vapor deposition of epitaxial buffer layers and superconductors

Shara S. Shoup, Subu Shanmugham, Donald Cousins, Andrew T. Hunt, M. Paranthaman, Amit Goyal, Patrick Martin, Donald M. Kroeger

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

A new low-cost, open-atmosphere deposition technique, Combustion Chemical Vapor Deposition (CCVD) is used to deposit epitaxial buffer layers and high-temperature superconductors on oxide single-crystal substrates. The CCVD process has the potential for manufacturing buffer layers and superconductors onto textured metal substrates in a continuous reel-to-reel production. CCVD does not use vacuum equipment or reaction chambers required by conventional techniques, while its coating quality rivals and even exceeds that of conventional methods. . Compounds being studied with the CCVD process include the buffer layers cerium oxide (CeO2), yttria stabilized zirconia (YSZ), strontium titanate (SrTiO3), lanthanum aluminate (LaAIO3), yttria (Y2O3), and ytterbium oxide (Yb2O3) and two rare earth superconductors, YBa2Cu3O7., (YBCO) and YbBa2Cu3O7.I (YbBCO).

Original languageEnglish
Pages (from-to)2426-2429
Number of pages4
JournalIEEE Transactions on Applied Superconductivity
Volume9
Issue number2 PART 2
DOIs
StatePublished - 1999

Funding

This work at MCT was sponsored by the Small Business Innovation Research Program (SBIR) for the U.S. Department of Energy (DOE) under contract # DE-FG02-97ER82345 and the U.S. Department of Defense under contract # F33615-98-C-5418. Work performed at ORNL, managed by Lockheed Martin Energy Research Corporation for the U.S. Department of Energy under contract # DE-AC05-960R22464, was sponsored by the above awards and the Division of Materials Sciences, Office of Basic Energy Sciences, and Office of Energy Efficiency and Renewable Energy, Ofice of Utility Technologies-SuperconductivityP rogram.

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