TY - JOUR
T1 - Lateral Temperature-Gradient Method for High-Throughput Characterization of Material Processing by Millisecond Laser Annealing
AU - Bell, Robert T.
AU - Jacobs, Alan G.
AU - Sorg, Victoria C.
AU - Jung, Byungki
AU - Hill, Megan O.
AU - Treml, Benjamin E.
AU - Thompson, Michael O.
N1 - Publisher Copyright:
© 2016 American Chemical Society.
PY - 2016/9/12
Y1 - 2016/9/12
N2 - A high-throughput method for characterizing the temperature dependence of material properties following microsecond to millisecond thermal annealing, exploiting the temperature gradients created by a lateral gradient laser spike anneal (lgLSA), is presented. Laser scans generate spatial thermal gradients of up to 5 °C/μm with peak temperatures ranging from ambient to in excess of 1400 °C, limited only by laser power and materials thermal limits. Discrete spatial property measurements across the temperature gradient are then equivalent to independent measurements after varying temperature anneals. Accurate temperature calibrations, essential to quantitative analysis, are critical and methods for both peak temperature and spatial/temporal temperature profile characterization are presented. These include absolute temperature calibrations based on melting and thermal decomposition, and time-resolved profiles measured using platinum thermistors. A variety of spatially resolved measurement probes, ranging from point-like continuous profiling to large area sampling, are discussed. Examples from annealing of III-V semiconductors, CdSe quantum dots, low-κ dielectrics, and block copolymers are included to demonstrate the flexibility, high throughput, and precision of this technique.
AB - A high-throughput method for characterizing the temperature dependence of material properties following microsecond to millisecond thermal annealing, exploiting the temperature gradients created by a lateral gradient laser spike anneal (lgLSA), is presented. Laser scans generate spatial thermal gradients of up to 5 °C/μm with peak temperatures ranging from ambient to in excess of 1400 °C, limited only by laser power and materials thermal limits. Discrete spatial property measurements across the temperature gradient are then equivalent to independent measurements after varying temperature anneals. Accurate temperature calibrations, essential to quantitative analysis, are critical and methods for both peak temperature and spatial/temporal temperature profile characterization are presented. These include absolute temperature calibrations based on melting and thermal decomposition, and time-resolved profiles measured using platinum thermistors. A variety of spatially resolved measurement probes, ranging from point-like continuous profiling to large area sampling, are discussed. Examples from annealing of III-V semiconductors, CdSe quantum dots, low-κ dielectrics, and block copolymers are included to demonstrate the flexibility, high throughput, and precision of this technique.
KW - annealing temperature gradients
KW - high-throughput annealing studies
KW - lateral gradient laser spike annealing
KW - spatially refined measurements
KW - thermal processing
UR - https://www.scopus.com/pages/publications/84986891155
U2 - 10.1021/acscombsci.6b00043
DO - 10.1021/acscombsci.6b00043
M3 - Article
C2 - 27385487
AN - SCOPUS:84986891155
SN - 2156-8952
VL - 18
SP - 548
EP - 558
JO - ACS Combinatorial Science
JF - ACS Combinatorial Science
IS - 9
ER -