Abstract
An annealing model is extended to treat the vaporization process, and a hydrodynamic model describes the ablated material. We find that dynamic source and ionization effects accelerate the expansion front of the ablated plume with thermal vaporization temperature. The vaporization process and plume propagation in high background gas pressure are studied.
| Original language | English |
|---|---|
| Pages (from-to) | 45-49 |
| Number of pages | 5 |
| Journal | Applied Surface Science |
| Volume | 96-98 |
| DOIs | |
| State | Published - Apr 1996 |
Funding
This work is supported by the Oak Ridge National Laboratory (ORNL) Directed Research and Development Funds and the Division of Materials Sciences, US Department of Energy, under contract DE-ACOS-84OR21400 with Lockheed Martin Energy Systems, Inc. K.R. Chen and C.L. Liu were supported in part by appointments to the ORNL Research Associate Program administered jointly by the Oak Ridge Institute for Science and Education and ORNL.