Abstract
Experiments are described in which semiconductor or metal films are grown from the vapor phase by photodissociating or photoionizing diatomic or polyatomic molecules. The photolysis of GeH4 at 248 nm (hw = 5 eV) is initiated by a two photon process that liberates the germylene radical GeH2. Spatially and temporally-resolved concentration profiles for several excited states of GeH and atomic Ge have been measured near the substrate. Thin indium films have been deposited on nickel substrates by dissociatively ionizing indium monoiodide (Inl) to produce In+ - I- ion pairs. The dynamics of ion pair production for thallium iodide or Inl vapor photoexcited at 193 nm have been studied by combining an excimer laser with microwave absorption techniques.
Original language | English |
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Pages (from-to) | 22-24 |
Number of pages | 3 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 459 |
DOIs | |
State | Published - Jun 14 1984 |
Externally published | Yes |
Event | Laser-Assisted Deposition, Etching, and Doping 1984 - Los Angeles, United States Duration: Jan 24 1984 → Jan 26 1984 |