Large-Area WS₂ Film with Big Single Domains Grown by Chemical Vapor Deposition

Engineering

• Chemical Vapor Deposition 100%
• Vapor Deposition 100%
• Atmospheric Pressure 100%
• Domain Size 50%
• Growth Condition 50%
• Crystal Quality 50%
• Layer Thickness 50%
• Band Structure 50%
• Gas Flowrate 50%
• Atomic Force Microscopy 50%
• Atomic Layer 50%
• Holding Time 50%
• Pressure Tube 50%
• Based Optoelectronic Device 50%
• Thin Films 50%
• Energy Band 50%
• Silicon Dioxide 50%
• Raman Spectra 50%

Material Science

• Chemical Vapor Deposition 100%
• Film 100%
• Tungsten 60%
• Atomic Force Microscopy 20%
• Photoluminescence 20%
• Transmission Electron Microscopy 20%
• Gas Flow 20%
• Electronic Band Structure 20%
• Thin Films 20%