Irradiation induced effects at interfaces in a nanocrystalline ceria thin film on a Si substrate

Philip D. Edmondson, Neil P. Young, Chad M. Parish, Fereydoon Namavar, William J. Weber, Yanwen Zhang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Thin films of nanocrystalline ceria on a Si substrate have been irradiated with 3 MeV Au+ ions to fluences of up to 1x1016 ions cm-2, at temperatures ranging between 160 to 400 K. During the irradiation, a band of contrast is observed to form at the thin film/substrate interface. Analysis by scanning transmission electron microscopy in conjunction with energy dispersive and electron energy loss spectroscopy techniques revealed that this band of contrast was a cerium silicate amorphous phase, with an approximate Ce:Si:O ratio of 1:1:3.

Original languageEnglish
Title of host publicationAdvances in Materials for Nuclear Energy
Pages87-92
Number of pages6
DOIs
StatePublished - 2013
Event2012 MRS Fall Meeting - Boston, MA, United States
Duration: Nov 25 2012Nov 30 2012

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1514
ISSN (Print)0272-9172

Conference

Conference2012 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA
Period11/25/1211/30/12

Funding

FundersFunder number
Engineering and Physical Sciences Research CouncilEP/H018921/1

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