TY - GEN
T1 - Irradiation induced effects at interfaces in a nanocrystalline ceria thin film on a Si substrate
AU - Edmondson, Philip D.
AU - Young, Neil P.
AU - Parish, Chad M.
AU - Namavar, Fereydoon
AU - Weber, William J.
AU - Zhang, Yanwen
PY - 2013
Y1 - 2013
N2 - Thin films of nanocrystalline ceria on a Si substrate have been irradiated with 3 MeV Au+ ions to fluences of up to 1x1016 ions cm-2, at temperatures ranging between 160 to 400 K. During the irradiation, a band of contrast is observed to form at the thin film/substrate interface. Analysis by scanning transmission electron microscopy in conjunction with energy dispersive and electron energy loss spectroscopy techniques revealed that this band of contrast was a cerium silicate amorphous phase, with an approximate Ce:Si:O ratio of 1:1:3.
AB - Thin films of nanocrystalline ceria on a Si substrate have been irradiated with 3 MeV Au+ ions to fluences of up to 1x1016 ions cm-2, at temperatures ranging between 160 to 400 K. During the irradiation, a band of contrast is observed to form at the thin film/substrate interface. Analysis by scanning transmission electron microscopy in conjunction with energy dispersive and electron energy loss spectroscopy techniques revealed that this band of contrast was a cerium silicate amorphous phase, with an approximate Ce:Si:O ratio of 1:1:3.
UR - http://www.scopus.com/inward/record.url?scp=84888057230&partnerID=8YFLogxK
U2 - 10.1557/opl.2013.387
DO - 10.1557/opl.2013.387
M3 - Conference contribution
AN - SCOPUS:84888057230
SN - 9781605114910
T3 - Materials Research Society Symposium Proceedings
SP - 87
EP - 92
BT - Advances in Materials for Nuclear Energy
T2 - 2012 MRS Fall Meeting
Y2 - 25 November 2012 through 30 November 2012
ER -