Ir and Ru bottom electrodes for (Ba, Sr) TiO3 thin films deposited by liquid delivery source chemical vapor deposition

Won Jae Lee; C. Basceri; S. K. Streiffer; A. I. Kingon; Doo Young Yang; Yung Park; Ho Gi Kim

doi:10.1016/S0040-6090(97)01043-2

Ir and Ru bottom electrodes for (Ba, Sr) TiO₃ thin films deposited by liquid delivery source chemical vapor deposition

Won Jae Lee, C. Basceri, S. K. Streiffer, A. I. Kingon, Doo Young Yang, Yung Park, Ho Gi Kim

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

The electrical properties and surface morphologies of (Ba, Sr)TiO₃ thin films, with various bottom electrode structures, deposited by liquid delivery metal organic chemical vapor deposition were investigated. Ir and Ru films as a bottom electrode with varying deposition temperatures were prepared onto SiO₂ and polySi substrate structures using ion beam sputtering technique. It is observed that electrical properties of BST films deposited by liquid delivery MOCVD was changed with the deposition temperatures of Ir and Ru as well as substrate structures. Furthermore, it is revealed that these variations in leakage current could be strongly related with the roughness of BST films.

Original language	English
Pages (from-to)	285-290
Number of pages	6
Journal	Thin Solid Films
Volume	323
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(97)01043-2
State	Published - Jun 22 1998
Externally published	Yes

Funding

The authors would like to thank Korea Science and Engineering Foundation (KOSEF) for its financial support.

Keywords

Bottom electrode structures
Chemical vapor deposition
Liquid delivery

Access to Document

10.1016/S0040-6090(97)01043-2

Cite this

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title = "Ir and Ru bottom electrodes for (Ba, Sr) TiO3 thin films deposited by liquid delivery source chemical vapor deposition",

abstract = "The electrical properties and surface morphologies of (Ba, Sr)TiO3 thin films, with various bottom electrode structures, deposited by liquid delivery metal organic chemical vapor deposition were investigated. Ir and Ru films as a bottom electrode with varying deposition temperatures were prepared onto SiO2 and polySi substrate structures using ion beam sputtering technique. It is observed that electrical properties of BST films deposited by liquid delivery MOCVD was changed with the deposition temperatures of Ir and Ru as well as substrate structures. Furthermore, it is revealed that these variations in leakage current could be strongly related with the roughness of BST films.",

keywords = "Bottom electrode structures, Chemical vapor deposition, Liquid delivery",

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T1 - Ir and Ru bottom electrodes for (Ba, Sr) TiO3 thin films deposited by liquid delivery source chemical vapor deposition

AU - Lee, Won Jae

AU - Basceri, C.

AU - Streiffer, S. K.

AU - Kingon, A. I.

AU - Yang, Doo Young

AU - Park, Yung

AU - Kim, Ho Gi

PY - 1998/6/22

Y1 - 1998/6/22

N2 - The electrical properties and surface morphologies of (Ba, Sr)TiO3 thin films, with various bottom electrode structures, deposited by liquid delivery metal organic chemical vapor deposition were investigated. Ir and Ru films as a bottom electrode with varying deposition temperatures were prepared onto SiO2 and polySi substrate structures using ion beam sputtering technique. It is observed that electrical properties of BST films deposited by liquid delivery MOCVD was changed with the deposition temperatures of Ir and Ru as well as substrate structures. Furthermore, it is revealed that these variations in leakage current could be strongly related with the roughness of BST films.

AB - The electrical properties and surface morphologies of (Ba, Sr)TiO3 thin films, with various bottom electrode structures, deposited by liquid delivery metal organic chemical vapor deposition were investigated. Ir and Ru films as a bottom electrode with varying deposition temperatures were prepared onto SiO2 and polySi substrate structures using ion beam sputtering technique. It is observed that electrical properties of BST films deposited by liquid delivery MOCVD was changed with the deposition temperatures of Ir and Ru as well as substrate structures. Furthermore, it is revealed that these variations in leakage current could be strongly related with the roughness of BST films.

KW - Bottom electrode structures

KW - Chemical vapor deposition

KW - Liquid delivery

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