TY - JOUR
T1 - Interaction of ultraviolet laser radiation with a xecl laser
AU - Geohegan, D. B.
AU - McCown, A. W.
AU - Eden, J. G.
PY - 1985/6
Y1 - 1985/6
N2 - A significant enhancement (up to 30%) in the output pulse energy of a XeCl laser (l = 308 nm) is observed when ultraviolet-laser radiation at 193, 248, or 351 nm is injected into the XeCl resonator before the emission of the 308-nm pulse. In each case, it appears that the enhancement hinges on the presence of impurity molecules (e.g., hydrocarbons, N2, O2) in the XeCl-laser-gas mixture. For linjectrd= 193 and 248 nm, the external radiation appears to photoionize the impurity directly, whereas, at 351 nm, the impurity is photoexcited and subsequently ionized by the discharge. Strong absorption of 248-nm radiation by the XeCl active medium is observed during and following the XeCl discharge-an effect that is also attributed to impurities.
AB - A significant enhancement (up to 30%) in the output pulse energy of a XeCl laser (l = 308 nm) is observed when ultraviolet-laser radiation at 193, 248, or 351 nm is injected into the XeCl resonator before the emission of the 308-nm pulse. In each case, it appears that the enhancement hinges on the presence of impurity molecules (e.g., hydrocarbons, N2, O2) in the XeCl-laser-gas mixture. For linjectrd= 193 and 248 nm, the external radiation appears to photoionize the impurity directly, whereas, at 351 nm, the impurity is photoexcited and subsequently ionized by the discharge. Strong absorption of 248-nm radiation by the XeCl active medium is observed during and following the XeCl discharge-an effect that is also attributed to impurities.
UR - http://www.scopus.com/inward/record.url?scp=84975607715&partnerID=8YFLogxK
U2 - 10.1364/JOSAB.2.000925
DO - 10.1364/JOSAB.2.000925
M3 - Article
AN - SCOPUS:84975607715
SN - 0740-3224
VL - 2
SP - 6
EP - 930
JO - Journal of the Optical Society of America B: Optical Physics
JF - Journal of the Optical Society of America B: Optical Physics
IS - 6
ER -