Integration of a dose control circuit with a vertically aligned nanofiber field emission device

T. Rahman, S. K. Islam, R. Vijayaraghavan, T. Gundman, S. A. Eliza, A. Hossain, B. Blalock, S. J. Randolph, L. R. Baylor, T. S. Bigelow, W. L. Gardner, M. N. Ericson, J. A. Moore

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

This article presents the integration of a dose control circuit (DCC) with vertically aligned carbon nanofiber (VACNF) field emission devices through a voltage boost up interface circuit for the implementation of the digital electrostatically focused e-beam array direct-write lithography concept. The VACNFs act as diodes with high turn on voltage (∼70 V). Commercially available complementary metal-oxide-semiconductor technology is not capable of handling such magnitude of voltages. The voltage boost up interface circuit described in this article offers an efficient technique to shift the voltage level to a level adequate to start the emission of electron from the tips of the VACNFs. The integration of the DCC with the VACNF emitters via a voltage boost up interface circuit presented in this article facilitates the operation of the VACNFs for etching in maskless lithography while providing precise control of emission.

Original languageEnglish
Pages (from-to)655-660
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume25
Issue number2
DOIs
StatePublished - 2007

Funding

This research was sponsored by the Defense Advanced Research Projects Agency (DARPA) under Contract No. DARPA-MIPR-97-1357.

FundersFunder number
Defense Advanced Research Projects Agency

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