Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers

L. Stafford, W. T. Lim, S. J. Pearton, M. Chicoine, S. Gujrathi, F. Schiettekatte, Jae Soung Park, Ju Il Song, Young Woo Heo, Joon Hyung Lee, Jeong Joo Kim, I. I. Kravchenko

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Fingerprint

Dive into the research topics of 'Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers'. Together they form a unique fingerprint.

Material Science